Modeling the edge-placement yield of a cut process for self-aligned multiple patterning

Zhang, Pan; Chen, Yijian

doi:10.1016/j.mee.2014.05.025

Microelectronic Engineering

2014

DOI: 10.1016/j.mee.2014.05.025

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Modeling the edge-placement yield of a cut process for self-aligned multiple patterning

Pan Zhang

Yijian Chen

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Modeling the edge-placement yield of a cut process for self-aligned multiple patterning

Cited by 1 publication

References 4 publications

Breaking through 1D layout limitations and regaining 2D design freedom Part I: 2D layout decomposition and stitching techniques for hybrid optical and self-aligned multiple patterning

Breaking through 1D layout limitations and regaining 2D design freedom Part I: 2D layout decomposition and stitching techniques for hybrid optical and self-aligned multiple patterning

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