2017
DOI: 10.1557/adv.2017.83
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Modeling of Plasma Expansion during Pulsed Electron Beam Ablation of Graphite

Abstract: Pulsed electron beam ablation (PEBA) has proven to be a promising and powerful technique for the growth of high quality thin films. Pulsed electron beam film deposition consists of many physical processes including target material heating, target ablation, plasma plume expansion, and film growth on a substrate. Plasma plume expansion into a vacuum or an ambient gas is a fundamental issue in PEBA as the quality of thin films deposited onto the substrate depends on the composition, energy and density of particle… Show more

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Cited by 3 publications
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“…where T a denotes the initial ambient temperature, P a denotes the initial ambient pressure, n v denotes the vapour density, and v denotes the initial velocity. Further, the debris material is ionized to form a high temperature and high pressure plasma expansion plumes when the pulse laser energy is close to 10 9 kW/cm 2 for the aluminum alloy, and the corresponding expression is given as follows [16]:…”
Section: Analysis Of Modelmentioning
confidence: 99%
“…where T a denotes the initial ambient temperature, P a denotes the initial ambient pressure, n v denotes the vapour density, and v denotes the initial velocity. Further, the debris material is ionized to form a high temperature and high pressure plasma expansion plumes when the pulse laser energy is close to 10 9 kW/cm 2 for the aluminum alloy, and the corresponding expression is given as follows [16]:…”
Section: Analysis Of Modelmentioning
confidence: 99%