Modeling of microsphere photolithography

Qu, Chuang; Zhu, Chen; Kinzel, Edward C.

doi:10.1364/oe.406290

Cited by 6 publications

(2 citation statements)

References 39 publications

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“…In addition, the simulation model for the SLPL process is complex as it takes into account factors such as the particle size, illumination wavelength, and substrate impact. Most theoretical studies of the SLPL process only examine parameter influences under specific conditions, , providing detailed relationships between exposure dose, development time, and resultant hole diameter. However, these studies only analyze circular patterns, neglecting other shapes producible by SLPL.…”

Section: Introductionmentioning

confidence: 99%

Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Yu,

Ma,

et al. 2023

Langmuir

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Micro/nanospherical lens photolithography (SLPL) constitutes an efficient and precise micro/nanofabrication methodology. It offers advantages over traditional nanolithography approaches, such as cost-effectiveness and ease of implementation. By using micrometer-sized microspheres, SLPL enables the preparation of subwavelength scale features. This technique has gained attention due to its potential applications. However, the SLPL process has a notable limitation in that it mostly produces simple pattern shapes, mainly consisting of circular arrays. There has been a lack of theoretical analysis regarding the possible shapes that can be created. In our experiments, we successfully prepared annular and ring-with-hole pattern shapes. To address this limitation, we applied the Mie scattering theory to systematically analyze and summarize the various patterns that can be obtained through the SLPL process. We also proposed methods to predict and obtain different patterns. This theoretical analysis enhances the understanding of SLPL and expands its potential applications, making it a valuable area for further research.

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Section: Introductionmentioning

confidence: 99%

Analysis of the Pattern Shapes Obtained By Micro/Nanospherical Lens Photolithography

Yu,

Ma,

et al. 2023

Langmuir

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“…Most of the works reporting successful microscopy or lithography applications consider the silica or polystyrene microspheres of specific size or illumination of specific wavelength [19][20][21]. While the complex studies considering the effects of particle size, illumination wavelength and the impact of the substrate with a high refractive index on the light focusing are rare and do not give a full understanding of the physical background.…”

Section: Introductionmentioning

confidence: 99%

Optimization of microsphere optical lithography for nano-patterning

Dvoretckaia¹,

Можаров²,

Berdnikov³

et al. 2021

J. Phys. D: Appl. Phys.

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We present an original approach to realistic modeling of light focusing by microsphere systems to form the photonic jets for nano-patterning of the substrates with high refractive index. In simulations we analyze the photonic jets produced by a single sphere and close-packed array of microspheres on the photoresist layer and Si substrate. We show how the lithographic profiles can be controlled by varying the exposure dose and system geometry in wide ranges of photoresist layer thicknesses and microsphere sizes. The modeling covers the entire lithographic system and accounts for the interference of focused light transmitted through the microlenses and reflected from the Si substrate. We use our approach to optimize the size of the lithographic pattern and confirm the simulation results experimentally. The suggested set of methods is rather universal and may be applied to other microlens and resist materials to minimize lithography lateral resolution.

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