Modeling of Cross-linking Reactions for Negative-type Thick film Resists

Sensu, Yoshihisa; Sekiguchi, Atsushi; Kono, Yoshiyuki

doi:10.2494/photopolymer.19.51

Cited by 5 publications

(3 citation statements)

References 12 publications

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“…Then, it was exposed to UV for 37 s for photolithography. Again, the exposed silicon wafer was placed on the hot plate and baked at 65 • C for 1 min and at 95 • C for 12 min [26]. The baked silicon wafer was cooled down and developed in a SU-8 developer until the catheter channel patterns were successfully obtained.…”

Section: Fabrication Of the Catheter Channel With Cavitiesmentioning

confidence: 99%

Prevention of Microsphere Blockage in Catheter Tubes Using Convex Air Bubbles

et al. 2020

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This paper presents a novel method to prevent blockages by embolic microspheres in catheter channels by using convex air bubbles attached to the channels’ inner wall surface. The clogging by microspheres can occur by the arching of the microspheres in the catheter. A few studies have been done on reducing the blockage, but their methods are not suitable for use with embolic catheters. In this study, straight catheter channels were fabricated. They had cavities to form convex air bubbles; additionally, a straight channel without the cavities was designed for comparison. Blockage was observed in the straight channel without the cavities, and the blockage arching angle was measured to be 70°, while no blockage occurred in the cavity channel with air bubbles, even at a geometrical arching angle of 85°. The convex air bubbles have an important role in preventing blockages by microspheres. The slip effect on the air bubble surface and the centrifugal effect make the microspheres drift away from the channel wall. It was observed that as the size of the cavity was increased, the drift distance became larger. Additionally, as more convex air bubbles were formed, the amount of early drift to the center increased. It will be advantageous to design a catheter with large cavities that have a small interval between them.

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Section: Fabrication Of the Catheter Channel With Cavitiesmentioning

confidence: 99%

Prevention of Microsphere Blockage in Catheter Tubes Using Convex Air Bubbles

et al. 2020

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“…It was known that thick resist molds fabricated using the negative resist SU-8 (Micro Chem) were useful because the pattern profiles were printed clearly and sharply and the sidewalls were perpendicular to the substrate surfaces. [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27] However, the most suitable exposure wavelength of SU-8 is 365 nm, and SU-8 is insensitive to light with a wavelength of 450 nm, which is most appropriate for exposure using the LCD panel. To solve this problem, a novel multilayer resist process was contrived to utilize SU-8, as shown in Fig.…”

Section: Fabrication Of Practical Thick Resist Moldsmentioning

confidence: 99%

“…It is known that thick resist molds fabricated using the negative resist SU-8 10,11) (Micro Chem), which is sensitive to ultraviolet (UV) light, are usable for nickel electroplating, because the patterns have sharp and clear profiles, and the side walls are perpendicular to the substrate surfaces. [12][13][14][15][16][17][18][19][20][21][22][23][24][25][26][27] However, the most suitable exposure wavelength for SU-8 is 365 nm. On the other hand, since the transmittance of the LCD panel markedly decreases at wavelengths of less than 420 -430 nm, LCD matrix exposure should be performed using light with a wavelength of more than 440 nm.…”

Section: Introductionmentioning

confidence: 99%

Application of Matrix Projection Exposure Using a Liquid Crystal Display Panel to Fabricate Thick Resist Molds

Fukasawa

Horiuchi

2009

Jpn. J. Appl. Phys.

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The patterning characteristics of matrix projection exposure using an analog liquid crystal display (LCD) panel in place of a reticle were investigated, in particular for oblique patterns. In addition, a new method for fabricating practical thick resist molds was developed. At first, an exposure system fabricated in past research was reconstructed. Changes in the illumination optics and the projection lens were the main improvements. Using fly's eye lenses, the illumination light intensity distribution was homogenized. The projection lens was changed from a common camera lens to a higher-grade telecentric lens. In addition, although the same metal halide lamp was used as an exposure light source, the central exposure wavelength was slightly shortened from 480 to 450 nm to obtain higher resist sensitivity while maintaining almost equivalent contrast between black and white. Circular and radial patterns with linewidths of approximately 6 mm were uniformly printed in all directions throughout the exposure field owing to these improvements. The patterns were smoothly printed without accompanying stepwise roughness caused by the cell matrix array. On the bases of these results, a new method of fabricating thick resist molds for electroplating was investigated. It is known that thick resist molds fabricated using the negative resist SU-8 (Micro Chem) are useful because very high aspect patterns are printable and the side walls are perpendicular to the substrate surfaces. However, the most suitable exposure wavelength of SU-8 is 365 nm, and SU-8 is insensitive to light of 450 nm wavelength, which is most appropriate for LCD matrix exposure. For this reason, a novel multilayer resist process was proposed, and micromolds of SU-8 of 50 mm thickness were successfully obtained. As a result, feasibility for fabricating complex resist molds including oblique patterns was demonstrated.

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