Modeling of Chemical Vapor Deposition of Tungsten Films

Kleijn, Chris R.; Werner, Christoph

doi:10.1007/978-3-0348-7741-1

Cited by 32 publications

(25 citation statements)

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“…26,27 This code has been applied successfully to the simulation of various thermal CVD processes, 1,27-29 as well as to the simulation of a steady-state atmospheric pressure methane-air flame. 30 For the latter, using the same gas-phase mechanism and transport properties, the flame length and thickness compared excellently to those simulated by Somers and de Goey.…”

Section: Discretization and Numerical Methodsmentioning

confidence: 99%

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Two-dimensional simulation of an oxy-acetylene torch diamond reactor with a detailed gas-phase and surface mechanism

Kleijn

Akker

Croon

et al. 2000

Journal of Applied Physics

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication Citation for published version (APA):Okkerse, M., Kleijn, C. R., van den Akker, H. E. A., Croon, de, M. H. J. M., & Marin, G. B. M. M. (2000). Twodimensional simulation of an oxy-acetylene torch diamond reactor with a detailed gas-phase and surface mechanism. Journal of Applied Physics, 88(7), 4417-4428. DOI: 10.1063/1.1309052 General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. A two-dimensional model is presented for the hydrodynamics and chemistry of an oxy-acetylene torch reactor for chemical vapor deposition of diamond, and it is validated against spectroscopy and growth rate data from the literature. The model combines the laminar equations for flow, heat, and mass transfer with combustion and deposition chemistries, and includes multicomponent diffusion and thermodiffusion. A two-step solution approach is used. In the first step, a lumped chemistry model is used to calculate the flame shape, temperatures and hydrodynamics. In the second step, a detailed, 27 species / 119 elementary reactions gas phase chemistry model and a 41 species / 67 elementary reactions surface chemistry model are used to calculate radicals and intermediates concentrations in the gas phase and at the surface, as well as growth rates. Important experimental trends are predicted correctly, but there are some discrepancies. The main problem lies in the use of the Miller-Melius hydrocarbon combustion mechanism for rich oxy-acetylene flames. ͓J. A. Miller and C. F. Melius, Combustion and Flame 91, 21 ͑1992͔͒. Despite this problem, some aspects of the diamo...

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Section: Discretization and Numerical Methodsmentioning

confidence: 99%

“…Therefore, thermodiffusion was accounted for using the Clark Jones approximation for multicomponent thermodiffusion. 25,26 …”

Section: ͑1͒mentioning

confidence: 99%

Two-dimensional simulation of an oxy-acetylene torch diamond reactor with a detailed gas-phase and surface mechanism

Kleijn

Akker

Croon

et al. 2000

Journal of Applied Physics

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“…56,57 The equations are discretized with the aid of the finite volume method on a 2D cylindrical grid of N r ϫN z ϭ61ϫ149 grid cells. A cell at the flame front typically has a radial dimension of 17 m and the sharp temperature rise in the flame front is spanned by at least five grid cells.…”

Section: B Two-dimensional Flame Simulationsmentioning

confidence: 99%

Influence of nitrogen on diamond growth in oxyacetylene combustion chemical vapor deposition

Croon

Kleijn

Marin

et al. 2002

Journal of Applied Physics

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Document VersionPublisher's PDF, also known as Version of Record (includes final page, issue and volume numbers) Please check the document version of this publication:• A submitted manuscript is the author's version of the article upon submission and before peer-review. There can be important differences between the submitted version and the official published version of record. People interested in the research are advised to contact the author for the final version of the publication, or visit the DOI to the publisher's website.• The final author version and the galley proof are versions of the publication after peer review.• The final published version features the final layout of the paper including the volume, issue and page numbers. Link to publication General rightsCopyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights.• Users may download and print one copy of any publication from the public portal for the purpose of private study or research.• You may not further distribute the material or use it for any profit-making activity or commercial gain • You may freely distribute the URL identifying the publication in the public portal ? Take down policyIf you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. Addition of di-nitrogen to the feed gas has been shown to greatly influence growth rates and morphology of the deposited layer in various diamond chemical vapor deposition ͑CVD͒ techniques. In this article, several hypotheses for these phenomena, as presented in literature, are tested for the case of diamond combustion CVD with the aid of an atmospheric pressure oxyacetylene flame. For this purpose, one-dimensional and two-dimensional simulations are performed of the hydrodynamics, the combustion and deposition chemistry, and the nitrogen chemistry. Based on the simulation results, several proposed hypotheses can be ruled out as possible explanations for the observed phenomena. It is concluded, that the most likely hypotheses are: ͑i͒ the presence of nitrogen atoms in the diamond lattice, enhancing diamond growth by acting on the electron structure of surface dimer bonds, and ͑ii͒ selective adsorption of nitrogen-containing species on the surface, selectively increasing growth in the ͑100͒ direction. It is found that possible gas phase candidates for affecting diamond growth are NH, NH 2 , NH 3 , CN, HCN, H 2 CN, and NCO.

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“…where ρ, v, P , µ, C p , κ represent gas density, velocity, pressure, viscosity, heat capacity, and thermal conductivity, respectively (Kleijn and Werner, 1993). A Galerkin discretization technique was used with globally defined trial functions to solve the gas flow field equations under the assumption of fully-developed, laminar flow and subject to no-slip boundary conditions at the chamber walls.…”

Section: Ulvac System For Tungsten Cvdmentioning

confidence: 99%

Model reduction for a tungsten chemical vapor deposition system

Chang

Adomaitis

1998

Proceedings of the 1998 American Control Conference. ACC (IEEE Cat. No.98CH36207)

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ISR develops, applies and teaches advanced methodologies of design and analysis toAbstract: A model of a tungsten chemical vapor deposition (CVD) system is developed to study the CVD system thermal dynamics and wafer temperature nonuniformities during a processing cycle. We develop a model for heat transfer in the system's wafer/susceptor/guard ring assembly and discretize the modeling equation with a multiple-grid, nonlinear collocation technique. This weighted residual method is based on the assumption that the system's dynamics are governed by a small number of modes and that the remaining modes are slaved to these slow modes. Our numerical technique produces a model that is effectively reduced in its dynamical dimension, while retaining the resolution required for the wafer assembly model. The numerical technique is implemented with only moderately more effort than the traditional collocation or pseudospectral techniques. Furthermore, by formulating the technique in terms of a collocation procedure, the relationship between temperature measurements made on the wafer and the simulator results produced with the reduced-order model remain clear.

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Modeling of Chemical Vapor Deposition of Tungsten Films

Cited by 32 publications

References 0 publications

Two-dimensional simulation of an oxy-acetylene torch diamond reactor with a detailed gas-phase and surface mechanism

Two-dimensional simulation of an oxy-acetylene torch diamond reactor with a detailed gas-phase and surface mechanism

Influence of nitrogen on diamond growth in oxyacetylene combustion chemical vapor deposition

Model reduction for a tungsten chemical vapor deposition system

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