Modeling and Simulation of Ion Energy Distribution Functions in Technological Plasmas

Mussenbrock, Thomas

doi:10.1002/ctpp.201210053

Cited by 14 publications

(13 citation statements)

References 57 publications

(116 reference statements)

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“…(Electrons respond to the transient electric field in any case.) As such, ions are slightly modulated as well, as there are times when the potential drop in front of the electrodes is smaller or greater than the averaged value . In addition, a low energy plateau with periodic humps is vaguely observed for both energy distributions.…”

Section: Simulation Resultsmentioning

confidence: 99%

Particle‐in‐Cell/Test‐Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

Trieschmann

Schmidt

Mussenbrock

2016

Plasma Processes & Polymers

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The paper provides a tutorial to the conceptual layout of a self‐consistently coupled Particle‐In‐Cell/Test‐Particle model for the kinetic simulation of sputtering transport in capacitively coupled plasmas at low gas pressures. It explains when a kinetic approach is needed and which numerical concepts allow for capturing the often observed nonequilibrium behavior of the charged and neutral particles. At the example of a generic sputtering discharge, both the fundamentals of the applied Monte Carlo methods as well as their conceptual details are elaborated on. Finally, two assumptions that are often exploited in the context of sputtering transport simulations, namely on the energy distribution of impinging ions as well as on the test particle approach, are validated for the proposed example discharge.

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Section: Simulation Resultsmentioning

confidence: 99%

Particle‐in‐Cell/Test‐Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

Trieschmann

Schmidt

Mussenbrock

2016

Plasma Processes & Polymers

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“…If the frequencies differ by about one order of magnitude, separate control of ion energy and ion flux is possible within the limitations of the disturbing influences of the frequency coupling and of secondary electrons . Another way to achieve separate control is the application of a voltage waveform consisting of a fundamental frequency and its subsequent harmonics . Here, the phase angles between the applied harmonics serve as control parameters of the voltage waveform.…”

Section: Introductionmentioning

confidence: 99%

“…Here, the phase angles between the applied harmonics serve as control parameters of the voltage waveform. For instance, waveforms with different absolute values of the global maximum and minimum or different rising and falling slopes can be generated, providing a method to control the symmetry of the discharge, the sheath dynamics and the ion energy at the two electrodes.…”

Section: Introductionmentioning

confidence: 99%

“…Using such advanced methods of customized driving voltage waveforms, the mean ion energy as well as the shape of the IFEDF can be controlled. Thus, the ion impact on a surface in a CCRF plasma can be tailored for specific applications .…”

Section: Introductionmentioning

confidence: 99%

“…and references therein). Several studies focused on the bimodal shape in the IFEDF caused by ions, that cross the sheath without collisions . Furthermore, the role of collisional redistribution of ions within the IFEDF, of the total sheath voltage, as well as of the ion dynamics at reduced driving frequencies have been investigated.…”

Section: Introductionmentioning

confidence: 99%

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A Simple Model for Ion Flux‐Energy Distribution Functions in Capacitively Coupled Radio‐Frequency Plasmas Driven by Arbitrary Voltage Waveforms

Schüngel

Schulze

2016

Plasma Processes & Polymers

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The ion flux‐energy distribution function (IFEDF) is of crucial importance for surface processing applications of capacitively coupled radio‐frequency (CCRF) plasmas. Here, we propose a model that allows for the determination of the IFEDF in such plasmas for various gases and pressures in both symmetric and asymmetric configurations. A simplified ion density profile and a quadratic charge voltage relation for the plasma sheaths are assumed in the model, of which the performance is evaluated for single‐ as well as multi‐frequency voltage waveforms. The IFEDFs predicted by this model are compared to those obtained from PIC/MCC simulations and retarding field energy analyzer measurements. Furthermore, the development of the IFEDF shape and the ion dynamics in the plasma sheath region are discussed in detail based on the spatially and temporally resolved model data.

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Ion energy distribution in a radio frequency sheath of plasma with Kappa electron velocity distribution

Huang

2020

Contributions to Plasma Physics

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A hybrid model consisting of a one-dimensional radio frequency sheath model and an equivalent circuit model is used to investigate the effect of the non-Maxwellian plasma with enhanced electron tails on ion energy distribution (IED) at the plasma-wall interface. With the assumption that electrons obey the Kappa distribution in which the parameter κ characterizes the deviation from Maxwellian distribution, the bimodal shape of the IED can always be found with the decrease of κ under the condition of current experimental advanced superconducting tokamak (EAST) discharges during the ion cyclotron range of frequency wave heating. However, the height of the low-energy peak of the IED decreases, while the high-energy peak does not change significantly. In addition, the IED shifts towards the higher-energy regime, and the width of the IED expands with the decrease of κ. It is also shown that frequency and amplitude of the disturbance current, bulk plasma density, and ion temperature are the crucial parameters for determining the shape of IED even in the presence of super-thermal electrons.

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Modeling and Simulation of Ion Energy Distribution Functions in Technological Plasmas

Cited by 14 publications

References 57 publications

Particle‐in‐Cell/Test‐Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

Particle‐in‐Cell/Test‐Particle Simulations of Technological Plasmas: Sputtering Transport in Capacitive Radio Frequency Discharges

A Simple Model for Ion Flux‐Energy Distribution Functions in Capacitively Coupled Radio‐Frequency Plasmas Driven by Arbitrary Voltage Waveforms

Ion energy distribution in a radio frequency sheath of plasma with Kappa electron velocity distribution

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