2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology 2010
DOI: 10.1109/icsict.2010.5667729
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Modeling and simulating for 3-D micro-manufacture process

Abstract: A novel 3-D surface model for micro-manufacture process simulation is presented. This model uses unit vector of the parametric surface as an important parameter to achieve the surface evolution algorithm. According to various physical models of given fabrications, it can be applied to simulations of isotropic/anisotropic etching, deposition and other processes with surface evolution direction dependence. The simulation results of this model are 3-D visible of variable perspective. Some isotropic etching and is… Show more

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