2023
DOI: 10.1007/s11665-023-07860-2
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Modeling and Optimization of Process Parameters during Grooved Hot Rolling of SAE 1541 Steel

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Cited by 2 publications
(1 citation statement)
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“…PVD is a set of techniques that deposit target materials onto a substrate by either evaporation or sputtering under a high vacuum ( Figure a). PVD can be classified into three main methods: electron‐beam evaporation, [ 106 ] sputtering, [ 107 ] and thermal evaporation [ 108 ] depending on the method used to produce the film. PVD can provide a stable process with a simple mechanism to deposit target materials by physical force; thus, it enables low‐temperature deposition under high vacuum and produces high‐purity thin film regardless of the substrate.…”
Section: Fabrication Methodsmentioning
confidence: 99%
“…PVD is a set of techniques that deposit target materials onto a substrate by either evaporation or sputtering under a high vacuum ( Figure a). PVD can be classified into three main methods: electron‐beam evaporation, [ 106 ] sputtering, [ 107 ] and thermal evaporation [ 108 ] depending on the method used to produce the film. PVD can provide a stable process with a simple mechanism to deposit target materials by physical force; thus, it enables low‐temperature deposition under high vacuum and produces high‐purity thin film regardless of the substrate.…”
Section: Fabrication Methodsmentioning
confidence: 99%