Articles you may be interested inFabrication of wafer-scale nanopatterned sapphire substrate by hybrid nanoimprint lithography J. Vac. Sci. Technol. B 32, 06FG06 (2014); 10.1116/1.4898778 Design and fabrication of a metallic nanostamp using UV nanoimprinting and electroforming for replicating discrete track media with feature size of 35 nm J. Vac. Sci. Technol. B 31, 011801 (2013); 10.1116/1.4768685 Fabrication of 1 Teradot/in.2 CoCrPt bit patterned media and recording performance with a conventional read/write head J. Vac. Sci. Technol. B 30, 06FH01 (2012); 10.1116/1.4757955Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate A master mold for nanoimprint lithography was fabricated for discrete track recording ͑DTR͒ media using electron beam lithography and conventional etching techniques. The DTR pattern, containing 167 tracks of 120 nm pitch ͑60 nm land and groove widths͒ and embedded servo information, was automatically generated using an in-house developed program and was optimized for faster electron beam writing on an x-y stage. A daughter mold was duplicated from the master mold by nanoimprinting, using UV-curable resist and an intermediate polymer stamp technique. Scanning electron microscope images showed that the daughter mold was accurately and completely reproduced from the master mold.