This work examines the possibility of silicon-tin (Si Sn ) alloy grown on silicon (Si) substrate via Si Sn virtual substrate (VS) for use in near-infrared (NIR) photonic devices. In this work, we use the finite element method (FEM) approach to study the proposed Si Sn -based field-effect phototransistors (FEPTs). The introduction of Sn leads to the redshift of wavelength due to the narrowing of bandgap energy. Theoretically, in order to investigate the device's electrical and optical performance, the current under dark and illumination, optical responsivity, and 3dB bandwidth are calculated. Moreover, their dependency on channel-length scaling is also investigated. In comparison to the existing Si phototransistor at λ = 850 nm, the proposed FEPT shows a comparatively high responsivity. Thus, the current work shows that the proposed Si Snbased FEPTs have the potential for use in low-cost optoelectronic receivers in NIR bands.