“…By pressing four lined probes on sample forming ohmic contact, constant current flows from two side-probes and voltage drop is measured by two inside-probes. Resistivity and square resistance can be calculated by theory functions [8], Although the use of magnetron sputtering makes it convenient to get high quality Cu films [9], few are known about the sputtering plasma during sputtering, such as the composition, the key radical, the electron temperature as well as how these factors influencing the quality of Cu film. Optical emission spectra (OES), as a simple, inexpensive and fairlyeasy to implement technique, was a very sensitive method of detection,applicable to a wide variety of fluorescing species [10].…”