Micropillar
arrays are an ideal model system for capillary-aided
thin film evaporation that can be fabricated with precise geometric
control using microfabrication methods. The capillary limit leading
to dryout is a critical performance metric for capillary-aided thin
film evaporation and is proportional to the product of the permeability
and capillary pressure. Capillary flow models for steady-state thin-film
evaporation typically employ capillary pressure and permeability as
separate parameters; however, it is difficult to separate the two
from experimental hemiwicking characterizations or dryout observations.
Furthermore, for micropillar arrays, local permeability depends on
meniscus curvature varying spatially and with the evaporation rate.
In this work, we use thin-film interference microscopy to profile
local meniscus curvature during steady-state evaporation of water
in a pure vapor environment. Local capillary pressure is calculated
from curvature without requiring knowledge of contact angle or permeability.
Results are compared against a Darcian semianalytical model for flow
through micropillar wicks incorporating local permeability due to
meniscus curvature. Although traditionally a slip boundary condition
has been assumed at the liquid–vapor interface, we find much
better agreement using a no-slip condition. The consequence of no-slip
behavior is larger pressure gradients for a given evaporation flux
and a lower dryout heat flux relative to a full slip condition. Heat
transfer coefficient data are also presented and discussed in terms
of curvature and sample geometry.