2020
DOI: 10.1016/j.matchemphys.2019.122487
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MnOx thin film based electrodes: Role of surface point defects and structure towards extreme enhancement in specific capacitance

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Cited by 10 publications
(5 citation statements)
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“…The areal capacitance (gravimetric capacitance) values at 0.25, 0.5, 1, 2, and 4 mA cm −2 current density are calculated to be 20.4, 16.8, 16.0, 15.8, and 15,7 mF cm −2 (51, 42.0, 40.0, 39.5, and 39.3 F g −1 ), respectively. The capacitive performance of MnO 2 /gra-H is comparable to other previously reported results in transition metal-based electrode materials (Table 4) [36][37][38][39][40]. In order to further research the long-term cycling stability of the MnO 2 /gra-H, MnO 2 /gra-H is performed over 1000 consecutive galvanostatic chargedischarge cycles at a constant current density of 4 mA cm −2 (Figure 5e).…”
Section: Resultssupporting
confidence: 82%
“…The areal capacitance (gravimetric capacitance) values at 0.25, 0.5, 1, 2, and 4 mA cm −2 current density are calculated to be 20.4, 16.8, 16.0, 15.8, and 15,7 mF cm −2 (51, 42.0, 40.0, 39.5, and 39.3 F g −1 ), respectively. The capacitive performance of MnO 2 /gra-H is comparable to other previously reported results in transition metal-based electrode materials (Table 4) [36][37][38][39][40]. In order to further research the long-term cycling stability of the MnO 2 /gra-H, MnO 2 /gra-H is performed over 1000 consecutive galvanostatic chargedischarge cycles at a constant current density of 4 mA cm −2 (Figure 5e).…”
Section: Resultssupporting
confidence: 82%
“…Several physical and chemical synthesis techniques have been employed to produce MnOx films, including magnetron sputtering [13][14][15], atomic layer deposition (ALD) [16][17][18][19], thermal evaporation [20,21], pulsed laser deposition (PLD) [22][23][24][25][26][27], spray pyrolysis [28], plasma-enhanced chemical vapor deposition (PE-CVD) [29], molecular beam epitaxy (MBE) [30], sol-gel processes [31,32], successive ionic layer adsorption and reaction (SILAR) [33], hydrothermal reaction, and electrodeposition [32,34,35]. PLD is an effective physical technique exploiting ablation of a target by intense laser pulses to grow thin films on a proper substrate.…”
Section: Introductionmentioning
confidence: 99%
“…From the CV investigations, the maximum areal capacitances obtained are 38 mF cm À2 for undoped CuO prepared at 373 K, 59 mF cm À2 for Cr-doped CuO prepared at 373 K, 101 mF cm À2 for Cr-doped CuO prepared at 473 K, 209 mF cm À2 for Cr-doped CuO prepared at 573 K, and 111 mF cm À2 for Cr-doped CuO prepared at 673 K at the scan rate of 10 mV s À1 . It is noted that the Cr-doped CuO film electrode fabricated at 573 K shows the best electrochemical performance with the highest areal capacitance of 209 mF cm À2 compared with the other thin-film electrodes such as Mn-doped CuO (81 mF cm À2 at 10 mV s À1 ), 28 CuO (30 mF cm À2 at 5 mV s À1 ), 49 MnO x (110 mF cm À2 at 5 mV s À1 ), 50 V 2 O 5 /graphene (22.4 at 0.7 A m À2 ), 51 and TiO 2 @MnO 2 (22 mF cm À2 at 5 mV s À1 . 52 Figure 7F shows a decreasing trend in the areal capacitance with increasing scan rates, which might be due to inadequate time for exchange of ions among electrolyte and interface of electrode during the electrochemical reactions.…”
Section: Discussionmentioning
confidence: 99%