2011
DOI: 10.1063/1.3651488
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Mn segregation in Ge/Mn5Ge3 heterostructures: The role of surface carbon adsorption

Abstract: Mn5Ge3 compound, with its room-temperature ferromagnetism and possibility to epitaxially grow on Ge, acts as a potential spin injector into group-IV semiconductors. However, the realization of Ge/Mn5Ge3 multilayers is highly hampered by Mn segregation toward the Ge growing surface. Here, we show that adsorption of some monolayers of carbon on top of the Mn5Ge3 surface prior to Ge deposition allows to greatly reduce Mn segregation. In addition, a fraction of deposited carbon can diffuse down to the underneath M… Show more

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Cited by 30 publications
(20 citation statements)
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“…We also note that the Ge deposition rate was precisely measured from RHEED intensity oscillations (error <3%) and at 450 • C. RHEED oscillations of Ge growth on a Ge substrate (Ge homoepitaxy) confirm an almost perfect layer-by-layer growth mode. Contrary to the designed structure and also to TEM images obtained after Ge overgrowth at temperatures below 250 • C (see, for example, figure 1(c) in [24] for Ge overgrowth at 250 • C), the present image reveals that the sample surface is terminated by a Mn 5 Ge 3 layer and no trace of Ge overlayers is detectable. Indeed, the observation in this TEM image of well-defined atomic rows, all being perpendicularly aligned to the interface, can be unambiguously attributed the hexagonal (0001) plane of Mn 5 Ge 3 , which is parallel to the (111) plane of Ge [11].…”
Section: Resultscontrasting
confidence: 99%
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“…We also note that the Ge deposition rate was precisely measured from RHEED intensity oscillations (error <3%) and at 450 • C. RHEED oscillations of Ge growth on a Ge substrate (Ge homoepitaxy) confirm an almost perfect layer-by-layer growth mode. Contrary to the designed structure and also to TEM images obtained after Ge overgrowth at temperatures below 250 • C (see, for example, figure 1(c) in [24] for Ge overgrowth at 250 • C), the present image reveals that the sample surface is terminated by a Mn 5 Ge 3 layer and no trace of Ge overlayers is detectable. Indeed, the observation in this TEM image of well-defined atomic rows, all being perpendicularly aligned to the interface, can be unambiguously attributed the hexagonal (0001) plane of Mn 5 Ge 3 , which is parallel to the (111) plane of Ge [11].…”
Section: Resultscontrasting
confidence: 99%
“…Based on the above results it becomes clear that any attempt to produce Ge/Mn 5 Ge 3 /Ge stacked layers should avoid high-temperature Ge deposition to prevent a Ge:Mn reaction forming surface Mn 5 Ge 3 layers. Recently, we have shown that adsorption of some MLs of carbon on the top of Mn 5 Ge 3 followed by Ge deposition at 250 • C, can greatly reduce Mn segregation [24]. The Ge overlayers were shown to be epitaxial with the (111) plane being parallel with the hexagonal (0001) plane of Mn 5 Ge 3 .…”
Section: Resultsmentioning
confidence: 99%
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“…It is generally accepted that Si and Ge atoms interdiffuse via both vacancy-and interstitial-related mechanisms [5]. It has been reported that filling the vacancy sites near the interface region is effective to prevent the interdiffusion [6][7][8]. Here, carbon (C) atoms with small atomic radius (about half of Ge) is very suitable to fill vacancies, so in this study, mediation effect of C on interfacial mixing in Ge growth were studied using C-covered Si surface (Ge/C/Si) and C over thin Ge buffer layer (Ge/C/Ge/Si) systems.…”
Section: Introductionmentioning
confidence: 99%
“…Mn 5 Ge 3 , crystallized in Mn 5 Si 3 ‐type structure, is an interesting multifunctional material, with a great potential application in spintronics 1–4. Its Curie temperature is in the vicinity of room temperature 5, 6, meanwhile, a large entropy change (9.3 J kg −1 K −1 at 50 kOe) near its Curie temperature was reported 7.…”
Section: Introductionmentioning
confidence: 99%