Mixed silicon–germanium clusters, SixGeyHz, in the gas phase by flash pyrolysis of silane and germane

Lemieux, Jessy M.; Chambreau, Steven D.; Zhang, Jingsong

doi:10.1016/j.cplett.2008.05.022

Cited by 10 publications

(5 citation statements)

References 38 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…An efficient route to the branched polysilane (H 3 Si) 3 Si-SiMe 3 was reported recently, and this species represents a promising precursor to bulk silicon . Extended tetrelane hydrides containing both Si and Ge centers (e.g., the butane analogue H 3 Ge-SiH 2 –SiH 2 –GeH 3 ) have been developed for CVD, − while the deposition of bulk or nanodimensional Ge from volatile germanium hydrides remains an active field of study post-2001. − While distannane H 3 Sn-SnH 3 has been prepared, this species is too thermally unstable to be used in a reliable fashion for materials synthesis. , As a result, SnH 4 and its deuterium analogue SnD 4 are commonly employed as part of synthetic protocols to access tin-containing solid state compounds, such as ternary Si x Ge y Sn z semiconductors of controllable composition. − …”

Section: Molecular Hydrides Of the Group 14 Metals (Silicon Germanium...mentioning

confidence: 99%

Molecular Main Group Metal Hydrides

et al. 2021

View full text Add to dashboard Cite

This review serves to document advances in the synthesis, versatile bonding, and reactivity of molecular main group metal hydrides within Groups 1, 2, and 12−16. Particular attention will be given to the emerging use of said hydrides in the rapidly expanding field of Main Group element-mediated catalysis. While this review is comprehensive in nature, focus will be given to research appearing in the open literature since 2001.

show abstract

Section: Molecular Hydrides Of the Group 14 Metals (Silicon Germanium...mentioning

confidence: 99%

Molecular Main Group Metal Hydrides

et al. 2021

View full text Add to dashboard Cite

show abstract

“…Despite all of these advancements in the chemistry of homoatomic Zintl ions, primarily Ge- and Sn-based, very little attention has been paid to heteroatomic species. At the same time, it is well-known that, theoretically, the electrical and optical properties of heteroatomic and metal-doped semiconductors can be tailored by varying the composition . The band gap of germanium, for instance, can be adjusted by the incorporation of tin into its structure: this narrows it to direct-band-gap levels of under 0.7 eV at a rate of approximately 12 meV per atomic percent of tin .…”

Section: Introductionmentioning

confidence: 99%

“…At the same time, it is well-known that, theoretically, the electrical and optical properties of heteroatomic and metal-doped semiconductors can be tailored by varying the composition . The band gap of germanium, for instance, can be adjusted by the incorporation of tin into its structure: this narrows it to direct-band-gap levels of under 0.7 eV at a rate of approximately 12 meV per atomic percent of tin . However, the solubility of these elements in each other is extremely low under equilibrium conditions.…”

Section: Introductionmentioning

confidence: 99%

Heteroatomic Deltahedral Zintl Ions of Group 14 and their Alkenylation

2009

View full text Add to dashboard Cite

Reported is the synthesis of Ge(9-x)Sn(x) heteroatomic deltahedral Zintl ions and their alkenylation by reactions with alkynes. The nine-atom clusters are made either by extraction from mixed Ge/Sn precursors with nominal composition K(4)Ge(9-x)Sn(x) or by dissolution of mixtures of the corresponding binary precursors K(4)Ge(9) and K(4)Sn(9) in solvents with high dielectric constants such as DMF, DMSO, and acetonitrile. Reactions of the heteroatomic clusters with alkynes such as Me(3)SiC[triple bond]CSiMe(3), HC[triple bond]CCpr (Cpr = cyclopropyl), and HC[triple bond]CPh in ethylenediamine resulted in the following structurally characterized compounds with alkenylated heteroatomic clusters: [K-(2,2,2-crypt)](3)[GeSn(8)-CH=CH(2)].en.tol (1), triclinic, P1, a = 13.9220(3) A, b = 14.9788(3) A, and c = 21.5892(5) A, alpha = 94.2580(10) degrees , beta = 98.5210(10) degrees , and gamma = 98.4890(10) degrees , V = 4382.31(16) A(3), Z = 2; [K-(2,2,2-crypt)](4)[Ge(2)Sn(7)(CH=CH(2))(2)](2).en (2), monoclinic, P2(1)/c, a = 48.1883(15) A, b = 12.1551(4) A, and c = 21.4824(7) A, beta = 90.052(2) degrees , V = 12583.0(7) A(3), Z = 4; [K-(2,2,2-crypt)](3)[GeSn(8)-CH=CHCpr].en (3), monoclinic, P2(1)/c, a = 17.9132(9) A, b = 22.7967(11) A, and c = 21.6922(12) A, beta = 98.409(2) degrees , V = 8763.0(8) A(3), Z = 4; [K-(2,2,2-crypt)](3)[Ge(2)Sn(7)-CH=CHPh].2en (4), monoclinic, P2(1)/n, a = 13.2583(5) A, b = 47.0565(17) A, and c = 15.9978(6) A, beta = 111.536(2) degrees , V = 9284.1(6) A(3), Z = 4. The potassium countercations of the divinyl-substituted cluster in 2 were exchanged for tetrapropylammonium cations, and the resulting compound was also crystallized and structurally characterized: [Pr(4)N](4)[Ge(2)Sn(7)(CH=CH(2))(2)](2) (5), triclinic, P1, a = 11.6757(8) A, b = 18.8150(16) A, and c = 21.0608(17) A, alpha = 112.327(3) degrees , beta = 91.550(3) degrees , and gamma = 91.892(3) degrees , V = 4273.5(6) A(3), Z = 2. All clusters were also characterized in solution by electrospray mass spectrometry.

show abstract

“…The flash pyrolysis experiments were conducted on a homebuilt VUV-PI-TOF-MS apparatus that has been previously described. [17][18][19][20] Samples of CH 3 SiCl 3 (99%) and Si(CH 3 ) 2 Cl 2 (99.5%) were obtained from Sigma-Aldrich. SiHCH 3 Cl 2 (98%) was obtained from Fisher Scientific.…”

Section: Methodsmentioning

confidence: 99%

Letter: Thermal Decomposition of Methyltrichlorosilane, Dimethyldichlorosilane and Methyldichlorosilane by Flash Pyrolysis Vacuum Ultraviolet Photoionization Time-of-Flight Mass Spectrometry

Lemieux

Zhang

2014

Eur J Mass Spectrom (Chichester)

Self Cite

View full text Add to dashboard Cite

The thermal decompositions of methyltrichlorosilane (MTS) (CH3SiCl3), dimethyldichlorosilane (Si(CH3)2Cl2), and methyldichlorosilane (SiHCH3Cl2) were studied at temperatures from -1000 K to 1500 K on a short timescale of 20 μs to 100 μs using flash pyrolysis vacuum ultraviolet single-photon ionization time-of-flight mass spectrometry. The pyrolysis of MTS proceeds primarily via Si-C bond homolysis to form the SiCl3 and methyl radicals. At elevated temperatures, SiCl2 production from secondary decomposition of SiCl3 becomes more important, and other pyrolysis pathways of MTS, including C-H bond fission and HCl elimination make minor contributions. The pyrolysis of Si(CH3)2Cl2 occurs mainly by the sequential loss of methyl radicals, ultimately forming a significant amount of SiCl2. Si(CH3)2Cl2 also has two minor decomposition channels at higher temperatures, molecular elimination of CH4 to form SiCH2Cl2 and of CH3Cl to form SiCH3Cl. The pyrolysis of SiHCH3Cl2 mainly undergoes sequential CH3 and H loss and/or molecular elimination of CH4 to form SiCl2, while molecular elimination of HCl to form SiCH3Cl also contributes. SiCl2 is produced in significant concentrations in the pyrolysis of all three molecules, suggesting that it is an important intermediate in SiC chemical vapor deposition from chloroorganosilanes.

show abstract

Mixed silicon–germanium clusters, SixGeyHz, in the gas phase by flash pyrolysis of silane and germane

Cited by 10 publications

References 38 publications

Molecular Main Group Metal Hydrides

Molecular Main Group Metal Hydrides

Heteroatomic Deltahedral Zintl Ions of Group 14 and their Alkenylation

Letter: Thermal Decomposition of Methyltrichlorosilane, Dimethyldichlorosilane and Methyldichlorosilane by Flash Pyrolysis Vacuum Ultraviolet Photoionization Time-of-Flight Mass Spectrometry

Contact Info

Product

Resources

About