2021
DOI: 10.3390/coatings11020176
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Mixed Films Based on MgO for Secondary Electron Emission Application: General Trends and MOCVD Prospects

Abstract: Doping process is widely used to improving emission performance of MgO films thicker than 10 nm via assisting the surface recharge and changing in electron structure. The present paper briefly reviews this strategy in a search for the new materials and structures being effective for secondary electron emission (SEE) and their diagnostics. Then, Metal-Organic Chemical Vapor Deposition (MOCVD) coupled with the specially selected precursor is suggested here as a new technique that transforms the refractory oxides… Show more

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Cited by 7 publications
(2 citation statements)
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“…Chemical vapor deposition is actively involved in science and industry in order to obtain high-quality film materials [1,2]. The process has many varieties, differing in the types of chemical reactions and the conditions for their procedures.…”
Section: Introductionmentioning
confidence: 99%
“…Chemical vapor deposition is actively involved in science and industry in order to obtain high-quality film materials [1,2]. The process has many varieties, differing in the types of chemical reactions and the conditions for their procedures.…”
Section: Introductionmentioning
confidence: 99%
“…Metal acetylacetonates belong to the β-diketonate family and are considered classic precursors for metal-organic chemical vapor deposition (MOCVD) applied to obtain highquality film materials [1][2][3][4][5][6]. Admittedly, the success of film preparation, especially thin and multicomponent ones, is crucially dependent on the thermal properties of the precursors used, which have to provide the essential level of metal-containing vapors fed to the deposition zone, thereby causing the formation of a coating of the desired microstructure, thickness, and composition.…”
Section: Introductionmentioning
confidence: 99%