Mitigating the Impact of Asymmetric Deformation on Advanced Metrology for Photolithography
Wenhe Yang,
Shuxin Yao,
Jing Cao
et al.
Abstract:Controlling overlay in lithography is crucial for improving the yield of integrated circuit manufacturing. The process disturbances can cause undesirable morphology changes of overlay targets (such as asymmetric grating), which can significantly impact the accuracy of overlay metrology. It is essential to decouple the overlay target asymmetry from the wafer deformation, ensuring that the overlay metrology is free from the influence of process-induced asymmetry (e.g., grating asymmetry and grating imbalance). H… Show more
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