2021
DOI: 10.1016/j.solmat.2021.111287
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Mist CVD of vanadium dioxide thin films with excellent thermochromic properties using a water-based precursor solution

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Cited by 14 publications
(8 citation statements)
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“…Although introducing surfactants or soluble polymers as dispersing agents would help, their removal in the following steps would lead to the destruction of VO 2 or the film structure. To date, mist-assisted chemical deposition of functional thin films has been developed for ZnO, In 2 O 3 , and SnO 2 films used in solar cells, sensors, transistors, etc. For the mist chemical deposition system, it is a challenge to prepare VO 2 films with phase purity . To overcome this challenge, NC-containing mist-deposition is a newly developed technique and has been applied to prepare the GZO film .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Although introducing surfactants or soluble polymers as dispersing agents would help, their removal in the following steps would lead to the destruction of VO 2 or the film structure. To date, mist-assisted chemical deposition of functional thin films has been developed for ZnO, In 2 O 3 , and SnO 2 films used in solar cells, sensors, transistors, etc. For the mist chemical deposition system, it is a challenge to prepare VO 2 films with phase purity . To overcome this challenge, NC-containing mist-deposition is a newly developed technique and has been applied to prepare the GZO film .…”
Section: Resultsmentioning
confidence: 99%
“… 40 43 For the mist chemical deposition system, it is a challenge to prepare VO 2 films with phase purity. 44 To overcome this challenge, NC-containing mist-deposition is a newly developed technique and has been applied to prepare the GZO film. 45 Here, we use this method to prepare the VO 2 –ZnO film.…”
Section: Resultsmentioning
confidence: 99%
“…A custom-built hot-wall mist CVD system was used for the deposition of V 2 O 3 films. The apparatus and procedure for mist CVD in this study were the same as those described in our previous report . The mist CVD was performed by supplying the precursor mist through N 2 at a flow rate of 6.0 L min –1 to the substrate heated to a predetermined temperature (450–650 °C) for 10 min.…”
Section: Methodsmentioning
confidence: 99%
“…The apparatus and procedure for mist CVD in this study were the same as those described in our previous report. 30 The mist CVD was performed by supplying the precursor mist through N 2 at a flow rate of 6.0 L min −1 to the substrate heated to a predetermined temperature (450−650 °C) for 10 min. After the mist supply was turned off, the substrate was cooled to <100 °C in a furnace under the flow of N 2 gas.…”
Section: ■ Experimental Sectionmentioning
confidence: 99%
“…12a; T lum and ΔT sol of the film are 48.1% and 5.2%, respectively, better than that obtained from some other methods such as solution processes and atmospheric pressure process. 155 The improvement in optical properties is attributed to the solvent change, i.e., the replacement of an ethanol-based precursor with an aqueous-based precursor; the water vapor atmosphere in the deposition chamber helps to stabilize vanadium in the tetravalent state. Annealing treatment can significantly enhance the MIT characteristics of epitaxial-VO 2 films (MOCVD).…”
Section: Nanoscale Reviewmentioning
confidence: 99%