Minimum spacing between suspended nanorods determined by stiction during two-photon polymerization

Sun, Maozhu; Li, Yudong; Cui, Haibo; Yang, Hong; Gong, Qihuang

doi:10.1007/s00339-010-5732-y

Cited by 3 publications

(3 citation statements)

References 15 publications

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“…When free radical polymerization is used for fabricating micro/nano-structures, the performance of the monomers becomes significant. In general, a monomer of high viscosity can shorten the exposure time and improve the photosensitivity [9]. A monomer of good mechanical stability can resist the variance of the size and the shape during fabrication and post-processing.…”

Section: Resultsmentioning

confidence: 99%

“…Based on this method, Scott and associates demonstrated 65 nm dots with a single photon fabrication process. However, the photoresin used in the reported work is of a slow curing speed and a low modulus after gelation [9], which could bring unexpected loss in resolution and therefore imposes a great challenge for reaching the full resolution capacity of the photoinhibited polymerization.…”

Section: Introductionmentioning

confidence: 99%

“…The monomer of high viscosity increases the photosensitivity of the photoresin [12] and enables a fast polymerization speed. The high modulus offers rigid strength [9] for a sharp edge of the patterns. The minimum feature size is reduced to 40 nm by the irradiation of inhibition light, which is 1/12 of the wavelength of the initiating laser used in the fabrication.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization

Cao¹,

Gan²,

Jia³

et al. 2011

Opt. Express

112

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An ethoxylated bis-phenol-A dimethacrylate based photoresin BPE-100 of relatively high photosensitivity and modulus is used for the creation of sub-50 nm features. This is achieved by using the direct laser writing technique based on the single-photon photoinhibited polymerization. The super-resolution feature is realized by overlapping two laser beams of different wavelengths to enable the wavelength-controlled activation of photoinitiating and photoinhibiting processes in the polymerization. The increased photosensitivity of the photoresin promotes a fast curing speed and enhances the photopolymerization efficiency. Using the photoresin BPE-100, we achieve 40 nm dots for the first time in the super-resolution fabrication technique based on the photoinhibited polymerization, and a minimum linewidth of 130 nm. The influence of the power of the inhibiting laser and the exposure time on the feature size is studied and the results agree well with the prediction obtained from a simulation based on a non-steady-state kinetic model.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization

Cao¹,

Gan²,

Jia³

et al. 2011

Opt. Express

112

View full text Add to dashboard Cite

show abstract

Controlling aspect ratios of suspended nanorods fabricated by multi-photon polymerization

Cui

Liu

et al. 2011

Appl. Phys. A

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Investigation of the optimal processing parameters for picosecond laser-induced microfabrication of a polymer–ceramic hybrid material

Käpylä¹,

Turunen²,

Pelto³

et al. 2011

J. Micromech. Microeng.

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This paper reports the effect of different process parameters on the resolution of direct laser writing by two-photon polymerization (2PP) with a low-cost Nd:YAG picosecond laser. Microstructures were fabricated from the hybrid polymer–ceramic material Ormocomp® and the impact of varying the laser beam focus position, average laser power and scanning speed were investigated in detail with scanning electron microscopy and atomic force microscopy imaging. With the appropriate laser beam focus settings, suspended structures could be fabricated. The laser intensity range of the so-called polymerization window and damage zone are reported along with the scanning speed range for producing uniform polymer lines. It is shown that very high resolution is achievable with this affordable picosecond laser 2PP system with feature sizes comparable to those previously reported for costly femtosecond laser systems. The discovered relationships between the process parameters and structure dimensions enable the design and fabrication of both 3D microstructures and nanometer scale surface features.

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Minimum spacing between suspended nanorods determined by stiction during two-photon polymerization

Cited by 3 publications

References 15 publications

High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization

High-photosensitive resin for super-resolution direct-laser-writing based on photoinhibited polymerization

Controlling aspect ratios of suspended nanorods fabricated by multi-photon polymerization

Investigation of the optimal processing parameters for picosecond laser-induced microfabrication of a polymer–ceramic hybrid material

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