Minimizing  tone reversal during 19x nm mask inspection: PMJ18 Best Paper (Conference Presentation)

Yonetani, Masashi; Seki, Kazunori; Badger, Karen; Birnstein, Anka; Heumann, Jan; Isogawa, Takeshi; Konishi, Toshio; Kodera, Yutaka

doi:10.1117/12.2503808

Photomask Technology 2018 2018

DOI: 10.1117/12.2503808

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Minimizing tone reversal during 19x nm mask inspection: PMJ18 Best Paper (Conference Presentation)

Masashi Yonetani

Kazunori Seki

Karen Badger

et al.

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Minimizing tone reversal during 19x nm mask inspection: PMJ18 Best Paper (Conference Presentation)

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