Minimal multi-target plasma sputtering tool

Takahashi, Kazunori; Saito, Taichi; Andõ, Akira; Yabuta, Yuki; Mizuguchi, Hisashi; Yamamoto, Nobuto; Kamei, Ryuichiro; Hara, Shiro

doi:10.1016/j.vacuum.2019.109000

Cited by 9 publications

(6 citation statements)

References 26 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Hence, sputtering only changes the surface roughness of the samples that in turn modifies the optical properties of the samples as mentioned in our earlier paper [5]. Sputtering by low energy ion beam bombardment has also been used to prepare the multi-layer metal thin films by K. Takahashi et al [51]. The irradiation or treatment time decides the fluence of the ions.…”

Section: Experimental Setup and Methodologymentioning

confidence: 96%

Optical Parameters of Atomically Heterogeneous Systems Created by Plasma Based Low Energy Ion Beams: Wavelength Dependence and Effective Medium Model

Singh

Bhattacharjee

2021

Front. Phys.

View full text Add to dashboard Cite

The article presents the irradiation effects of low energy (∼0.5 keV) inert gaseous Argon ion beams on optical constants [real (n) and imaginary (k) parts of the refractive index], dielectric constants, skin depth, and optical conductivity of copper (Cu), silver (Ag), and aluminum (Al) metallic thin films (MTF). The optical constants of pristine MTF are obtained by employing the universal Kramers-Kronig (KK) technique. The reflectivity of pristine MTF measured using UV-VIS-NIR spectrophotometry is used as an input parameter in the KK technique to determine the optical constants as a function of energy [or wavelength (λ)] of incident light ranging between ∼1–4.96 eV (or 250–1,200 nm). For the irradiated MTF, the optical constants including the skin depth (δ = λ/2πk), optical conductivity (σ = nkc/λ), and dielectric constants (ϵ1 = n2 − k2 and ϵ2 = 2nk) with varying ion fluence have been investigated by implementing the Maxwell-Garnett (MG) approximation, used to determine the effective dielectric constants of a random mixture of two different mediums. Additionally, n and k obtained from MG approximation have been compared with those obtained using the pseudo- Brewster angle technique for four different laser wavelengths (405, 532, 632.8 and 670 nm) and are found to be in good agreement with each other. It is observed that the optical constants and optical conductivity of the MTF decrease with increase in ion beam fluence, while the skin depth increases. Besides the optical constants, the behavior of skin depth, dielectric constants, and optical conductivity of the irradiated MTF with varying fluence are discussed in this article.

show abstract

Section: Experimental Setup and Methodologymentioning

confidence: 96%

Optical Parameters of Atomically Heterogeneous Systems Created by Plasma Based Low Energy Ion Beams: Wavelength Dependence and Effective Medium Model

Singh

Bhattacharjee

2021

Front. Phys.

View full text Add to dashboard Cite

show abstract

“…Thus, it does not require a clean room for the fab and reduces the development and production costs for high-mix and low-volume products. Figure 10 shows a photograph of the minimal multi-target sputtering tool developed by some of authors [70]. All of the components composing each tool, e.g., a wafer transfer mechanics, a programmable controller, a vacuum chamber, a pumping system, a mass flow controller, AC-DC convertors, an rf plasma source, and an rf generator, have to be contained in a compact frame of 29.5 cm in width, 45 cm in depth, and 144 cm in height, which is standardized to connect the different processing tools.…”

Section: Industrial Plasmasmentioning

confidence: 99%

“…In a traditional rf plasma source system, output rf power from a generator is transferred to a load via an impedance matching box consisting of two variable ca-Fig. 10 Photograph of a minimal multi-target sputtering tool [70].…”

Section: Industrial Plasmasmentioning

confidence: 99%

Magnetic Nozzle Radiofrequency Plasma Systems for Space Propulsion, Industry, and Fusion Plasmas

TAKAHASHI

Charles

Boswell

et al. 2023

Plasma and Fusion Research

Self Cite

View full text Add to dashboard Cite

Low-pressure radiofrequency (rf) plasma sources have been widely used in various fields. When static magnetic fields are applied to these sources, a diverging magnetic field configuration known as a magnetic nozzle forms downstream of the source and interesting phenomena are observed. Such structures are frequently observed in space, e.g., the surface of the Sun and the geomagnetic fields. Here, the studies performed by the authors over the last decade on the fundamental plasma physics, the space plasma propulsion, the industrial plasma technology, and the radiofrequency ion source, are briefly overviewed. The design of sources based on the type of application is an important issue. Integrating a rf plasma source into a system often requires a compact and automatically controlled system, as presented here. Herein, interaction between the low-temperature plasmas and the hot fusion plasmas is sometimes mentioned in terms of "Plasma Apparatus."

show abstract

“…2014; Takahashi et al. 2020). In those types of sources, an external magnetic field and a radiofrequency generator are required; the cost is more expensive and the system becomes complicated compared with the magnetron source.…”

Section: Introductionmentioning

confidence: 99%

“…This type of source has a good efficiency and a low cost with a simple structure and electrical circuits, while the plasma production and sputtering cannot be individually controlled (Gudmundsson 2020). Other types of sputtering reactors such as electron cyclotron resonance or helicon-type sputtering that can control the ion energy and target bias separably have also been developed (Kanno et al 1996;Chabert et al 2000;Muñoz-García et al 2014;Takahashi et al 2020). In those types of sources, an external magnetic field and a radiofrequency generator are required; the cost is more expensive and the system becomes complicated compared with the magnetron source.…”

mentioning

confidence: 99%

Temporally resolved measurement of a force induced by a pulsed water-fuelled magnetron sputtering source

Shimizu,

Takahashi

2024

J. Plasma Phys.

Self Cite

View full text Add to dashboard Cite

A high-speed solenoid-type pulsed valve is applied to a water-fuelled magnetron sputtering thruster, which can lead a compact and neutralizer-free electric propulsion device by generating a thrust due to the ejection of the sputtered target material, in order to minimize the size of the gas feeding system. The pulsed valve is opened for approximately 5 msec and the gaseous water is introduced into the source via a gas line connected to the source. A dc high voltage is firstly applied between the cathode and the anode; then the discharge is sustained for the period in which a gas pressure enough for the discharge is maintained and a change in the discharge mode is observed during the discharge pulse. To investigate the impact of the mode change on the thrust generation, a temporally resolved measurement of the force is equivalently performed by installing a pulsed voltage power supply and by changing the pulse width of the discharge voltage. The results show the temporal reduction of the thrust-to-power ratio during a pulsed discharge due to the nonlinear correlation between ion energy and sputtering yield. It is suggested that the use of a pulsed valve would be useful for downsizing of the electric propulsion system, while an optimization to properly control the gas flow rate is needed for further development.

show abstract

Minimal multi-target plasma sputtering tool

Cited by 9 publications

References 26 publications

Optical Parameters of Atomically Heterogeneous Systems Created by Plasma Based Low Energy Ion Beams: Wavelength Dependence and Effective Medium Model

Optical Parameters of Atomically Heterogeneous Systems Created by Plasma Based Low Energy Ion Beams: Wavelength Dependence and Effective Medium Model

Magnetic Nozzle Radiofrequency Plasma Systems for Space Propulsion, Industry, and Fusion Plasmas

Temporally resolved measurement of a force induced by a pulsed water-fuelled magnetron sputtering source

Contact Info

Product

Resources

About