Miniaturization of Josephson junction for digital superconducting circuits

Abstract

In this work we briefly overview various options for Josephson junctions which should be scalable down to nanometer range for utilization in nanoscale digital superconducting technology. Such junctions should possess high values of critical current, Ic, and normal state resistance, Rn. Another requirement is the high reproducibility of the junction parameters across a wafer in a fabrication process. We argue that Superconductor -Normal metal -Superconductor (SN-N-NS) Josephson junction of "variable thickness bridge" geometry is a promising choice to meet these requirements. Theoretical analysis of SN-N-NS junction is performed in the case where the distance between the S-electrodes is comparable to the coherence length of the N-material. The restriction on the junction geometrical parameters providing the existence of superconductivity in the S-electrodes is derived for the current flowing through the junction of an order of Ic. The junction heating as well as available mechanisms for the heat removal is analyzed. The obtained results show that an SN-N-NS junction with a high (sub-millivolt) value of IcRn product can be fabricated from a broadly utilized combination of materials like Nb/Cu using well-established technological processes. The junction area can be scaled down to that of semiconductor transistors fabricated in the frame of a 40-nm process.