2008
DOI: 10.1143/jjap.47.4052
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Miniature Surface Acoustic Wave Duplexer Using SiO2/Al/LiNbO3 Structure for Wide-Band Code-Division Multiple-Access System

Abstract: In this paper, we describe the development of a miniature surface acoustic wave (SAW) duplexer for Band I in the standard of the Third-Generation Partnership Project (3GPP) at a 2 GHz band. We employed a shear-horizontal SAW on a SiO 2 overlay/ thick Al electrode/5 YX-LiNbO 3 structure, which offers a high electromechanical coupling coefficient (K 2 ) as well as a small temperature coefficient of frequency (TCF). This feature is crucial for the realization of a wide duplex gap between the transmitting and rece… Show more

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Cited by 81 publications
(52 citation statements)
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(14 reference statements)
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“…Use of apodized IDTs is the traditional countermeasure [12,37]. Since the apodization may cause Q reduction and relatively large device size [37], various techniques were proposed as another means [17,18,38].…”
Section: A Sio 2 Overlaymentioning
confidence: 99%
See 1 more Smart Citation
“…Use of apodized IDTs is the traditional countermeasure [12,37]. Since the apodization may cause Q reduction and relatively large device size [37], various techniques were proposed as another means [17,18,38].…”
Section: A Sio 2 Overlaymentioning
confidence: 99%
“…First one is based on deposition of an amorphous SiO 2 layer on interdigital transducers (IDTs) and reflectors fabricated on a traditional LN/LT substrate [4][5][6][7][8][9][10][11][12][13][14][15][16][17][18]. This is based on a unique feature of SiO 2 , i.e., it becomes mechanically stiff with T, giving positive temperature coefficient of elasticity (TCE) and TCV.…”
Section: Introductionmentioning
confidence: 99%
“…6 shows another example. A SAW device fabricated on a 5 o YX-LiNbO 3 substrate [12] is used as a DUT. An Al IDT with the line width of 0.5 µm is covered by a SiO 2 layer.…”
Section: Measured Examplementioning
confidence: 99%
“…There are also previous research studies that investigated the effect of the deposited shape of the SiO 2 film on SAW device characteristics. [14][15][16][17][18][19] The reason why research studies on the SiO 2 film have been actively conducted is that the SiO 2 film has TCF whereby positive and negative are different from those of the substrate materials. Therefore, when it is necessary to improve the TCF of the SAW devices, the SiO 2 film for passivation is better than the Si 3 N 4 film, which has the same sign of TCF as the substrate materials.…”
Section: Introductionmentioning
confidence: 99%