2005
DOI: 10.1016/j.msec.2005.07.017
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Milling of polymeric photonic crystals by focused ion beam

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Cited by 12 publications
(11 citation statements)
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“…Sub-100 nm patterns formed by EBL usually have low aspect ratios and Gaussian sidewall profiles and this makes the subsequent bonding/assembly process difficult. FIB milling directly into polymers for nanostructure fabrication is still at a very early stage of development due to: 182,183 (1) chemical changes induced in the polymer after direct milling arising from interactions with the impinging high energy ions; (2) charge build-up due to the insulating nature of the polymers; and (3) localized heating due to the low thermal conductivity of the material. Therefore, rather than direct patterning into polymer substrates, EBL and FIB have been used as a means of defining nanostructures in a thin resist layer, which are then transferred to an underlying hard substrate, such as Si or quartz-based nanofluidic chips, 154,184 or for imprint stamps containing nanofluidic structures.…”
Section: Fabrication Of Nanochannels and Nanoslits In Polymersmentioning
confidence: 99%
“…Sub-100 nm patterns formed by EBL usually have low aspect ratios and Gaussian sidewall profiles and this makes the subsequent bonding/assembly process difficult. FIB milling directly into polymers for nanostructure fabrication is still at a very early stage of development due to: 182,183 (1) chemical changes induced in the polymer after direct milling arising from interactions with the impinging high energy ions; (2) charge build-up due to the insulating nature of the polymers; and (3) localized heating due to the low thermal conductivity of the material. Therefore, rather than direct patterning into polymer substrates, EBL and FIB have been used as a means of defining nanostructures in a thin resist layer, which are then transferred to an underlying hard substrate, such as Si or quartz-based nanofluidic chips, 154,184 or for imprint stamps containing nanofluidic structures.…”
Section: Fabrication Of Nanochannels and Nanoslits In Polymersmentioning
confidence: 99%
“…La mise en oeuvre de la méthode des ondes planes (PWM, Plan Wave Method) travaillant dans l'espace des vecteurs d'onde k par la technique des différences finies dans le domaine temporel (FDTD, Finite-difference Time-Domain) permet de déterminer les modes dont la propagation est autorisée (39,40). Résumons les principaux résultats (41,42). Pour une bande interdite située autour de 1,55 µm, la valeur de a est de 0,775 µm pour une épaisseur des motifs organiques diffractifs de 1 µm et une épaisseur de substrat supérieure à 1,55 µm.…”
Section: B Les Dispositifs à Bande Interdite Organique (Bipo)unclassified
“…[1][2][3][4][5] Recently, the need for ion-beam etching of organic materials without damage to the underlying structure has been identified for use in techniques such as in-depth mass analysis or nanoscale fabrication of organic materials such as cells, drugs and polymer devices. However, conventional ion beam irradiation generally induces damage such as carbonization, chemical bond breaking/recombination, and conformational change.…”
Section: Introductionmentioning
confidence: 99%