Millimeter and submillimeter-wave spectroscopy of silicon difluoride

Molecular structure, atomization energy, ionization energy, electron affinity and vibrational spectrum of SiX2(X = F, Cl, Br, I) by theoretical methods

“…In fact, both neutral and charged species are involved in various processes such as chemical vapour deposition and glow discharge deposition [2]. Among the silicon compounds, silicon dihalides, SiX 2 (X ¼ F, Cl, Br, I), are particularly important in synthetic chemistry and they have been the subject of various studies [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19]. Silicon difluoride is one of the major product in plasma etching of silicon containing films in the manufacture of microelectronic devices.…”

“…Silicon difluoride is one of the major product in plasma etching of silicon containing films in the manufacture of microelectronic devices. Silicon difluoride is the dihalide that has been most extensively studied experimentally [3][4][5][6][7]10,14,18] and theoretically [1,2,8,9,[11][12][13]17]. Silicon dichloride is an active intermediate in lowpressure discharges of chlorosilanes and this is mainly responsible for the increasing interest in the study of the compound [15][16][17][18].…”