2020
DOI: 10.1364/optica.388383
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Mid-infrared laser diodes epitaxially grown on on-axis (001) silicon

Abstract: The direct epitaxial growth of III-V semiconductor lasers on standard, CMOS-compatible, on-axis (001) Si substrates is actively sought for the realization of active photonic integrated circuits. Here we report on the first mid-infrared semiconductor laser epitaxially grown on on-axis Si substrates, i.e., compatible with industry standards. Furthermore, these GaSb-based laser diodes demonstrate low threshold current density, low optical losses, high temperature operation, and … Show more

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Cited by 44 publications
(40 citation statements)
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“…The threshold-current densities are around 650-700 A.cm −2 , identical for all cavity length. This value is significantly lower than that measured (900-1000 A.cm −2 ) with similar LDs grown in an all-MBE process on offcut Si substrates [14] and approaches the value (400-500 A.cm −2 ) obtained on all-MBE on-axis LDs [8].…”
Section: Threshold Current Densitycontrasting
confidence: 54%
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“…The threshold-current densities are around 650-700 A.cm −2 , identical for all cavity length. This value is significantly lower than that measured (900-1000 A.cm −2 ) with similar LDs grown in an all-MBE process on offcut Si substrates [14] and approaches the value (400-500 A.cm −2 ) obtained on all-MBE on-axis LDs [8].…”
Section: Threshold Current Densitycontrasting
confidence: 54%
“…Prior to being loaded into the MBE reactor, the 50-mm GaSb-on-Si MOVPE template was thoroughly cleaned with organic solvents before being treated with an oxygen plasma to remove any residual resist contamination. The template was then handled in the same way as a regular, epi-ready GaSb substrate [13] and the laser structure was similar to previous ones grown on Si [8,14,15] for the sake of comparison. The wafer was heated up to around 560°C under Sb 2 flux for oxide removal.…”
Section: Mbe Of the Laser Heterostructurementioning
confidence: 99%
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“…However, its best advantage lies in the feasibility of integration in complex CMOS electronics [ 14 , 15 ]. Recent progress in laser sources integration on silicon [ 16 ] makes it possible to consider fully integrated compact sensors. For these reasons, silicon-based micro-resonator seems to be the best choice for the future development of very compact gas sensors integrated on the same chip with electronics, a laser, and a mechanical resonator.…”
Section: Introductionmentioning
confidence: 99%