Microwave absorption on a thin film

Bosman, H.; Lau, Y. Y.; Gilgenbach, R. M.

doi:10.1063/1.1556969

Cited by 118 publications

(88 citation statements)

References 9 publications

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“…It should be noted here that the maximal absorption results have been obtained in several previous publications for other thin film systems. 5,[15][16][17][18] The typical square resistance is ∼10 −2 for a skin depth thickness of noble metal film in microwave frequencies, and thus the incident microwave is almost exclusively reflected due to the huge mismatch between R s and Z 0 . In order to enhance the EM dissipation in the film, we need decrease σ or h or both.…”

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confidence: 99%

Microwave absorptions of ultrathin conductive films and designs of frequency-independent ultrathin absorbers

Anwar

et al. 2014

AIP Advances

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We study the absorption properties of ultrathin conductive films in the microwave regime, and find a moderate absorption effect which gives rise to maximal absorbance 50% if the sheet (square) resistance of the film meets an impedance matching condition. The maximal absorption exhibits a frequency-independent feature and takes place on an extremely subwavelength scale, the film thickness. As a realistic instance, ∼5 nm thick Au film is predicted to achieve the optimal absorption. In addition, a methodology based on metallic mesh structure is proposed to design the frequency-independent ultrathin absorbers. We perform a design of such absorbers with 50% absorption, which is verified by numerical simulations.

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confidence: 99%

Microwave absorptions of ultrathin conductive films and designs of frequency-independent ultrathin absorbers

Anwar

et al. 2014

AIP Advances

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“…Bosman et al 16) have studied microwave absorption of contaminant (supposing as thin film disk) on a microwave window. According to the results, the temperature rise of the contaminant was expressed as:…”

Section: Discussionmentioning

confidence: 99%

“…Depth of penetration, that is, skin depth (defined as the distance from the surface into the material at which the power drops to e À1 of the original value) is given by 16)…”

Section: Discussionmentioning

confidence: 99%

Microwave Heating of Thin Au Film

Sueyoshi

Kakiuchi

2007

Mater. Trans.

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Thin Au film was prepared by sputtering and evaporation methods with a quartz substrate, followed by microwave irradiation in air (frequency of microwave: 2.45 GHz, incident flux of microwave: 563 W, irradiation time: 600 s). As a result, it was confirmed that microwave heating of thin Au film is feasible. The growth of crystalline and particles due to microwave heating was confirmed from AFM observation and XRD analysis.Thin Au film is continuously heated during microwave irradiation, regardless of a preparation method of thin film. Microwave heating depends on the amount of microwave absorption on a thin Au film, which is related to the thickness and microstructure of the thin Au film. The rate of temperature rise depends on the ratio of a thickness to resistivity of thin Au film.

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“…The variation of this parameter (δ) depends on the characteristics of the metallic material used in the film production, mainly its electric conductivity, and also on the incident radiation wavelength that interacts with the film (Ohring, 1991). When the metallic layer thickness is adequate, the resulting electric current becomes confined into the film (Salmon, 1993) and losses occur (Bosman, Lau and Gilgenbach, 2003;Shubin, et al, 2000).…”

Section: Introductionmentioning

confidence: 99%