Microstructures, surface areas, and oxygen absorption of Ti and Ti–Zr–V films grown using glancing-angle sputtering

Abstract

Highly porous Ti and TiZrV getter film coatings have been successfully grown on (100) silicon substrates using the glancing-angle direct-current magnetron sputtering method. The evolution of the microstructures of the Ti and the TiZrV films strongly depends on the sputtering flux rate, surface diffusion rate, nucleation rate, compositions, and self-shadowing geometry of the nuclei on the sputtering flux. The larger the glancing angle, the higher the porosity and specific surface area of the Ti and TiZrV films. The weight-gain results strongly depend on several factors, such as specific surface area, the surface structure of the getter film, the diffusion rate of O in the getter film, the reactivity of Ti, Zr, and V on O, and the order of the stabilities of Ti, Zr, and V oxides on the film’s surface. Porous Ti film absorbs oxygen better than porous TiZrV film does due to its higher surface area and the high diffusion rate of O in Ti films.

Electrochemical characterization of nanostructured Ag:TiN thin films produced by glancing angle deposition on polyurethane substrates for bio-electrode applications

“…According to Brett's team, GLAD can be defined as a technique that "employs oblique angle deposition and substrate motion to engineer thin film microstructures on a nanometre scale in three dimensions". Hence, oblique, fixed or mobile substrates were then successfully applied to the sputtering of numerous materials such as metals, alloys, oxides and fluorides, among others [26][27][28][29][30]. In recent years, the extensive dissemination of their works in leading scientific journals demonstrates the strong interest generated by nanostructured thin films prepared with this method.…”

Metal oxide morphology in argon-assisted glancing angle deposition

“…While unassisted film properties such as column tilt angle, [35][36][37][38][39][40][41][42][43] normalized film density, [44][45][46][47] and surface area [48][49][50][51][52][53][54] have been studied, reports focusing on ion-assisted film properties are limited. While unassisted film properties such as column tilt angle, [35][36][37][38][39][40][41][42][43] normalized film density, [44][45][46][47] and surface area [48][49][50][51][52][53][54] have been studied, reports focusing on ion-assisted film properties are limited.…”