Microstructure, optical and electrical properties of CrAlN film as a novel material for high temperature solar selective absorber applications

Chen, Jianlin; Guo, Chenxi; Chen, Jian; He, Jiaqing; Ren, Yongmao; Hu, Linlin

doi:10.1016/j.matlet.2014.06.159

Cited by 21 publications

(12 citation statements)

References 18 publications

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“…This is because the surface had not been nitridized due to low N 2 flow rate. Moreover, an additional metallic phase also existed [7]. Table 2.…”

Section: Resultsmentioning

confidence: 99%

“…Several multi-layer absorbers, consisting of different metals (Mo, Ag, Ni, Cr, and Ti) and dielectric layers (Al 2 O 3 , SiO 2 , CeO 2 , NiO, and Cr 2 O 3 ), have been used as solar materials [7][8][9][10]. Recently, a coating made from either transition metal nitride or oxynitrides has attracted the attention of several researchers, because the constituents of the coating have remarkable chemical, mechanical, electrical, and optical properties.…”

Section: Technical Development Team Sunda Korea Suwon 443-766 Koreamentioning

confidence: 99%

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Optical Properties of Multi-layer TiNO/AlCrNO/Al Cermet Films Using DC Magnetron Sputtering

Han¹,

Park²,

Kim³

et al. 2015

Transactions on Electrical and Electronic Materials

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Among many the oxynitrides, TiNO and AlCrNO, have diverse applications in different technological fields. We prepared TiNO/AlCrNO/Al thin films on aluminum substrates using the method of dc reactive magnetron sputtering. The reactive gas flow, gas mixture, and target potential were applied as the sputtering conditions during the deposition in order to control the chemical composition. The multi-layer films have been prepared in an Ar and O 2 +N 2 gas mixture rate. The surface properties were estimated by performing scanning electron microscopy (SEM). At a wavelength range of 0.3~2.5 μm, the exact composition and optical properties of thin films were measured by Auger electron spectroscopy (AES) and Ultraviolet-visible-near infrared (UV-Vis-NIR) spectrophotometry. The optimal absorptance of multi-layer films was exhibited above 95.5% in the visible region of the electromagnetic spectrum, and the reflectance was achieved below 1.89%.

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“…This is because the surface had not been nitridized due to low N 2 flow rate. Moreover, an additional metallic phase also existed [7]. Table 2.…”

Section: Resultsmentioning

confidence: 99%

Section: Technical Development Team Sunda Korea Suwon 443-766 Koreamentioning

confidence: 99%

Optical Properties of Multi-layer TiNO/AlCrNO/Al Cermet Films Using DC Magnetron Sputtering

Han¹,

Park²,

Kim³

et al. 2015

Transactions on Electrical and Electronic Materials

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show abstract

“…Thirdly, the reactive sputtering using the metal target can easily control the binary film composition with components and contents of gas injection. Lastly it has the advantage of gaining a high deposition rate, and it is able to regulate the thickness of thin films [14][15][16].…”

Section: Introductionmentioning

confidence: 99%

Growth and Properties of CrN_x/TiN_y/Al Based on N₂Gas Flow Rate for Solar Thermal Applications

Ju¹,

Jang²,

Jang³

et al. 2016

Transactions on Electrical and Electronic Materials

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The CrN/TiN/Al thin films for solar selective absorber were prepared by dc reactive magnetron sputtering with multi targets. The binary nitride CrN layer deposited with change in N 2 gas flow rates. The gas mixture of Ar and N2 was an important parameter during sputtering deposition because the metal volume fraction (MVF) was controlled by the N2 gas flow rate. In this study, the crystallinity and surface properties of the CrN/TiN/Al thin films were estimated by X-ray diffraction (XRD), atomic force microscopy (AFM) and field emission scanning electron microscopy (FESEM). The composition and depth profile of thin films were investigated using Auger electron spectroscopy (AES). The absorptance and reflectance with wavelength spectrum were recorded by UV-Vis-NIR spectrophotometry at a range of 300~1,100 nm.

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“…CrAlN films have been reported as a novel candidate material for high-temperature solar selective absorber coatings with good thermal stability and oxidation resistance [14]. The CrAlN film was determined as Al-doped CrN phase and showed similar reflectance and absorptance characteristics to those of TiN based films in the solar spectrum region of 300-2600 nm and exhibited semiconductor nature with a sheet resistance of 38 kΩ/sq [14].…”

Section: Introductionmentioning

confidence: 99%

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

Zou

Huang

Wang

et al. 2015

Solar Energy Materials and Solar Cells

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Microstructure, optical and electrical properties of CrAlN film as a novel material for high temperature solar selective absorber applications

Cited by 21 publications

References 18 publications

Optical Properties of Multi-layer TiNO/AlCrNO/Al Cermet Films Using DC Magnetron Sputtering

Optical Properties of Multi-layer TiNO/AlCrNO/Al Cermet Films Using DC Magnetron Sputtering

Growth and Properties of CrN_x/TiN_y/Al Based on N₂Gas Flow Rate for Solar Thermal Applications

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

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Microstructure, optical and electrical properties of CrAlN film as a novel material for high temperature solar selective absorber applications

Cited by 21 publications

References 18 publications

Optical Properties of Multi-layer TiNO/AlCrNO/Al Cermet Films Using DC Magnetron Sputtering

Optical Properties of Multi-layer TiNO/AlCrNO/Al Cermet Films Using DC Magnetron Sputtering

Growth and Properties of CrNx/TiNy/Al Based on N2Gas Flow Rate for Solar Thermal Applications

Effects of antireflection layers on the optical and thermal stability properties of a spectrally selective CrAlN–CrAlON based tandem absorber

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Growth and Properties of CrN_x/TiN_y/Al Based on N₂Gas Flow Rate for Solar Thermal Applications