2006
DOI: 10.1016/j.apsusc.2005.11.069
|View full text |Cite
|
Sign up to set email alerts
|

Microstructure of epitaxial scandium nitride films grown on silicon

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

2
23
1

Year Published

2007
2007
2019
2019

Publication Types

Select...
5
1
1

Relationship

2
5

Authors

Journals

citations
Cited by 32 publications
(26 citation statements)
references
References 12 publications
2
23
1
Order By: Relevance
“…The deposition conditions and properties of optimised ScN layers on silicon have previously been described [13] and an optimum deposition temperature of 850 1C was identified. However, for this study, a number of other films grown under non-optimised conditions (at temperatures varying from 650 to 900 1C) were also employed in order to assist in determining the effects of variation in buffer layer properties upon the subsequently grown GaN.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The deposition conditions and properties of optimised ScN layers on silicon have previously been described [13] and an optimum deposition temperature of 850 1C was identified. However, for this study, a number of other films grown under non-optimised conditions (at temperatures varying from 650 to 900 1C) were also employed in order to assist in determining the effects of variation in buffer layer properties upon the subsequently grown GaN.…”
Section: Methodsmentioning
confidence: 99%
“…Employing different deposition conditions can give a limited degree of control over film crystallinity. However, for optimum deposition conditions [13], the film crystallinity qualitatively improves upon increasing film thickness, as measured by X-ray diffraction integrated peak intensities (over and above the monotonic rise in intensity intrinsically expected for increasingly thick films). Thicker films would also be expected to act as more effective diffusion barriers.…”
Section: Scn Buffer Layersmentioning
confidence: 98%
“…Optical absorption studies were performed on the ScN/c-GaN/ GaAs samples, giving a bandgap for ScN between 2.1 and 2.2 eV, in agreement with the literature [12].…”
Section: Article In Pressmentioning
confidence: 99%
“…Epitaxial growth of ScN has, however, been achieved using a number of techniques on different substrates. Techniques include magnetron sputtering onto MgO(0 0 1) [4,6], rf sputtering and plasma-assisted physical vapour deposition onto quartz, sapphire and Si substrates [7], hydride vapour phase epitaxy onto sapphire [8] and SiC [9] as well as molecular beam epitaxy (MBE) onto MgO [10], sapphire(0 0 0 1) [10,11], Si(111) [12] and Si(0 0 1) [13]. Results indicate that ScN, either takes on the substrate orientation or is polycrystalline.…”
Section: Introductionmentioning
confidence: 99%
“…Morem et al studied MBE deposition of 111 oriented ScN on Si (111). 134 They show that the quality of ScN film depends on the growth temperature. The highest ScN films quality on Si(111) was grown at optimum growth temperature of 850°C.…”
Section: Review Of Scandium Nitride (Scn)mentioning
confidence: 99%