2020
DOI: 10.1016/j.apsusc.2019.145131
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Microstructure, mechanical and physical properties of FeCoNiAlMnW high-entropy films deposited by magnetron sputtering

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Cited by 28 publications
(17 citation statements)
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“…Data are taken from Refs. [15,16,18,19,22–25,47,74,78,80,95,110,113,118,121,125,126,130,137,138,143,148–174].…”
Section: Structure Of Hescsmentioning
confidence: 99%
“…Data are taken from Refs. [15,16,18,19,22–25,47,74,78,80,95,110,113,118,121,125,126,130,137,138,143,148–174].…”
Section: Structure Of Hescsmentioning
confidence: 99%
“…There are numerous factors that can influence the sputtering of high entropy alloys such as the deposition parameters, substrate temperature, and the post-processing treatment (Mwema et al, 2019;Oladijo et al, 2021;Simon, 2018) , and a summary of the factors that are influencing the sputtered HEA deposition is presented in Table 1. From the Table, power, temperature, substrate bias and pressure are significant process parameters on deposition of HEAs thin films.…”
Section: Sputtering Process Parameter-property Relationship Of High E...mentioning
confidence: 99%
“…Smooth grains were formed at room temperature in the form of sheets. A FeCoNiAlMnW film deposited at 200 • C showed two types of grains, polyhedral with a size of 100−150 nm and other tiny grains with a size of 20−30 nm [66]. As the temperature increases, the ultrafine grains became larger with a size ranging between 60 and 100 nm.…”
Section: Deposition Ratementioning
confidence: 99%
“…Lin et al reported the reduction of residual stress and the annihilation of vacancies in (Cr 0.35 Al 0.25 Nb 0.12 Si 0.08 V 0.20 )N film by increasing the temperature, resulting in improved hardness [28]. In the case of FeCoNiAlMnW film, Sun et al [66] observed a fluctuated variation of the hardness by changing the temperature of the substrate.…”
Section: Mechanical and Tribological Properties 421 Hardnessmentioning
confidence: 99%