2018
DOI: 10.1111/jace.15769
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Microstructure and tribological behavior of TiAlSiN coatings deposited by deep oscillation magnetron sputtering

Abstract: Development of pulsed‐techniques aimed to generate highly ionized target species and high plasma density opens up a new way to tailor composition, structure, and properties of coatings. In this work, TiAlSiN coatings have been deposited at various negative substrate biases (Vs) using deep oscillation magnetron sputtering by sputtering a TiAlSi compound target in Ar/N2 mixtures. The increase in Vs from −30 to −120 V resulted in a decrease in (111)‐preferred orientation and grain size, together with the increase… Show more

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Cited by 46 publications
(9 citation statements)
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References 42 publications
(133 reference statements)
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“…It is noted that the coatings deposited at 4 kW and -60 V show random orientations of ( 111) and (220). According to our previous researches, the disappearance of the preferred orientation is attributed to the formation of ultra ne grains [40,41].…”
Section: Resultsmentioning
confidence: 71%
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“…It is noted that the coatings deposited at 4 kW and -60 V show random orientations of ( 111) and (220). According to our previous researches, the disappearance of the preferred orientation is attributed to the formation of ultra ne grains [40,41].…”
Section: Resultsmentioning
confidence: 71%
“…The increased HiPIMS target sputtering power and appropriate substarte bias are e cient to generate high ionization rate of target species and the increased metal ion bombardment [40,43]. Thus, a mass of momentum transfer between the growing lm and the incoming metal ions results in the re nement of microstructure with a less coarse columnar.…”
Section: Resultsmentioning
confidence: 99%
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“…In all cases, the coating is bombarded during the synthesis by ions accelerated from the gas discharge plasma [23][24][25][26] or using broad beam sources of ions or fast gas atoms [27][28][29]. The bombardment improves adhesion and other properties of the coatings [30][31][32][33][34]. For example, when negative 45-kV pulses with 50 µs width and 50 Hz repetition rate are applied to a substrate made of high speed steel (HSS) instead of bias voltage~80 V, the sputtered titanium nitride coating exhibits improved adhesion and nanostructure, a change of yellow color to brown, an increase in microhardness from 2500 HV to 5000 HV, and a decrease in internal stress [35][36][37].…”
Section: Introductionmentioning
confidence: 99%