Microstructure and texture of EB-PVD TBCs grown under different rotation modes

Schulz, Uwe; Terry, Scott G.; Levi, Carlos G.

doi:10.1016/s0921-5093(03)00470-2

Cited by 131 publications

(79 citation statements)

References 11 publications

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“…Large categories of materials can be prepared by electron beam evaporation technique [11] such as amorphous and crystalline semiconductors [12], metals [13], oxides [14], and molecular materials [15].…”

Section: Electron Beam Evaporationmentioning

confidence: 99%

Advance Deposition Techniques for Thin Film and Coating

Jilani¹,

Abdel-wahab²,

HosnyHammad³

2017

Modern Technologies for Creating the Thin-Film Systems and Coatings

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Thin films have a great impact on the modern era of technology. Thin films are considered as backbone for advanced applications in the various fields such as optical devices, environmental applications, telecommunications devices, energy storage devices, and so on . The crucial issue for all applications of thin films depends on their morphology and the stability. The morphology of the thin films strongly hinges on deposition techniques. Thin films can be deposited by the physical and chemical routes. In this chapter, we discuss some advance techniques and principles of thin-film depositions. The vacuum thermal evaporation technique, electron beam evaporation, pulsed-layer deposition, direct current/radio frequency magnetron sputtering, and chemical route deposition systems will be discussed in detail.

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Section: Electron Beam Evaporationmentioning

confidence: 99%

Advance Deposition Techniques for Thin Film and Coating

Jilani¹,

Abdel-wahab²,

HosnyHammad³

2017

Modern Technologies for Creating the Thin-Film Systems and Coatings

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show abstract

“…5(a). Voids at the horizontal interfaces were studied because (1) they effectively test the analytical model on the role of the horizontal interfaces; and (2) due to a shadowing effect, voids are most likely to form at the growth surfaces that are oblique to the deposition flux 63,64 , which is likely to be the case for the horizontal GaN surface when Al is deposited on the roughened GaN. The same set of simulations as those explored in Fig.…”

Section: B Effects Of Interfacial Voids Flux Direction and Interatmentioning

confidence: 99%

Relationship of thermal boundary conductance to structure from an analytical model plus molecular dynamics simulations

et al. 2013

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Thermal boundary resistance dominates the overall resistance of nanosystems. This effect can be utilized to improve the figure of merit of thermoelectric materials. It is also a concern for thermal failures in microelectronic devices. The interfacial resistance sensitively depends on many interrelated structural details including material properties of the two layers, the system dimensions, the interfacial morphology, and the defect concentrations near the interface. The lack of an analytical understanding of these dependences has been a major hurdle for a science-based design of optimum systems on a nanoscale. Here we have combined an analytical model with extensive, highly-converged direct method molecular dynamics simulations to derive analytical relationships between interfacial thermal boundary resistance and structural features. We discover that thermal boundary resistance linearly decreases with total interfacial area that can be modified by interfacial roughening. This finding is further elucidated using wave packet analysis and local density of state calculations.

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“…EB-PVD-produced coatings consist of a relatively homogeneous columnar structure composed of compact single columns. The bulky structure is only interrupted by a certain amount of intercolumnar gaps and voids between feather arms on the outer shell and a small amount of internal porosity (Ref 12,13). Figure 4 shows a typical EB-PVD 7YSZ TBC microstructure in cross section.…”

Section: Tbc With Columnar Microstructurementioning

confidence: 99%

Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase

2011

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Plasma spray-physical vapor deposition (PS-PVD) is a low pressure plasma spray technology recently developed by Sulzer Metco AG (Switzerland). Even though it is a thermal spray process, it can deposit coatings out of the vapor phase. The basis of PS-PVD is the low pressure plasma spraying (LPPS) technology that has been well established in industry for several years. In comparison to conventional vacuum plasma spraying (VPS) or low pressure plasma spraying (LPPS), the new proposed process uses a high energy plasma gun operated at a reduced work pressure of 0.1 kPa (1 mbar). Owing to the high energy plasma and further reduced work pressure, PS-PVD is able to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional physical vapor deposition (PVD) technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and electron beam-physical vapor deposition (EB-PVD) coatings. In contrast to EB-PVD, PS-PVD incorporates the vaporized coating material into a supersonic plasma plume. Owing to the forced gas stream of the plasma jet, complex shaped parts such as multi-airfoil turbine vanes can be coated with columnar thermal barrier coatings using PS-PVD. Even shadowed areas and areas which are not in the line of sight of the coating source can be coated homogeneously. This article reports on the progress made by Sulzer Metco in developing a thermal spray process to produce coatings out of the vapor phase. Columnar thermal barrier coatings made of Yttria-stabilized Zircona (YSZ) are optimized to serve in a turbine engine. This process includes not only preferable coating properties such as strain tolerance and erosion resistance but also the simultaneous coverage of multiple air foils.

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Microstructure and texture of EB-PVD TBCs grown under different rotation modes

Cited by 131 publications

References 11 publications

Advance Deposition Techniques for Thin Film and Coating

Advance Deposition Techniques for Thin Film and Coating

Relationship of thermal boundary conductance to structure from an analytical model plus molecular dynamics simulations

Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase

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