1999
DOI: 10.1016/s0921-5093(98)01181-2
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Microstructure and morphology of high temperature oxidation in superalloys

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Cited by 49 publications
(25 citation statements)
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“…5c. The formation of voids was thought to accelerate spallation of oxide scale due to the decrease in adherence of scale/substrate interface [9,10]. Figure 6 shows the cross-sectional micrograph and the corresponding element distribution maps of T-800 after exposure at 1,000°C for 20 h, which presents a relative simple structure compared to the case at 800°C.…”
Section: Isothermal Oxidation Kineticsmentioning
confidence: 99%
“…5c. The formation of voids was thought to accelerate spallation of oxide scale due to the decrease in adherence of scale/substrate interface [9,10]. Figure 6 shows the cross-sectional micrograph and the corresponding element distribution maps of T-800 after exposure at 1,000°C for 20 h, which presents a relative simple structure compared to the case at 800°C.…”
Section: Isothermal Oxidation Kineticsmentioning
confidence: 99%
“…Khalid et al 15 reported in their studies on high temperature oxidation behaviour of Incoloy 800H and Incoloy 825 alloys at 1000 and 1200 o C and observed that the former exhibited a compact, dense and adherent oxide layer, whereas in the latter the oxide layer has broken. They attributed the comparatively less oxidation resistance of the Incoloy 825 to the presence of coarse Ti-rich inclusions, which shows the less dissolution of Ti in the alloy.…”
mentioning
confidence: 99%
“…Besides, a SiO 2 film is formed during growth of oxides due to a lower solubility of Si and the variation in the activities of the elements in the solution [23,16].…”
Section: Oxidation Behavior Of the Ebs 740 Superalloymentioning
confidence: 99%