Microstructure and mechanical property evaluation of pulsed DC magnetron sputtered Cr–B and Cr–B–N films

Chi, Cheng; Lee, Jyh-Wei; Ho, Li-Wei; Chen, Hsien‐Wei; Chan, Yu-Chen; Duh, Jenq‐Gong

doi:10.1016/j.surfcoat.2011.09.047

Cited by 29 publications

(5 citation statements)

References 39 publications

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“…Previous studies reported that doping CrN thin films with Al, Ti, B, or Si can improve their mechanical properties. CrAlN coatings exhibit higher hardness than CrN coatings as well as superior thermal stability and a lower coefficient of friction [6][7][8][9]. Alloying Al to CrN was initially intended to enhance resistance to oxidation; however, ternary AlCrN films also exhibit excellent hardness and thermal stability due to the B1 structure of the metastable Al x Cr 1−x N solid solution and nanoscale-sized domains [10].…”

Section: Introductionmentioning

confidence: 99%

Effects of Substrate Rotation Speed on Structure and Adhesion Properties of CrN/CrAlSiN Multilayer Coatings Prepared Using High-Power Impulse Magnetron Sputtering

et al. 2020

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We investigated the effects of substrate rotation speed on the structural and mechanical properties of CrN/CrAlSiN multilayer coatings produced using high-power impulse magnetron sputtering (HiPIMS) on silicon and high-speed steel (HSS) substrates. Structural analysis and characterization of the multilayer coatings were performed using an X-ray diffractometer (XRD), field emission scanning electron microscopy (FE-SEM), an electron probe microanalyzer (EPMA), and a transmission electron microscope (TEM). The thickness of the bi-layer film depended on the substrate rotation speed, as follows: 12 (1.5 rpm), 9.5 (2 rpm), 6 (3 rpm), 4 (4 rpm), and 3.2 nm (5 rpm). The results revealed that the hardness and coating–substrate adhesion strength increased inversely with the thickness of the bi-layer. TEM analysis revealed smaller columnar structures in thinner CrN/CrAlSiN multilayer coatings. The highest results for hardness (20.1 GPa), elastic modulus (336 GPa), and adhesion strength (77 N) were obtained at a substrate rotation speed of 5 rpm. We also investigated the adhesion properties of the multilayer structures and formulated a hypothesis to explain adhesion strength.

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Section: Introductionmentioning

confidence: 99%

Effects of Substrate Rotation Speed on Structure and Adhesion Properties of CrN/CrAlSiN Multilayer Coatings Prepared Using High-Power Impulse Magnetron Sputtering

et al. 2020

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“…They are generally deposited as thin films using magnetron sputtering with TiB 2 as the most widely studied diboride [1][2][3][4][5][6][7], but there are also reports on CrB 2 [8][9][10], ZrB 2 [11][12][13], HfB 2 [14,15], WB 2 [16], and TaB 2 [17]. MeB 2 films are almost exclusively sputtered from compound MeB 2 targets since a reactive process is undesirable considering the toxic nature and explosiveness of B-containing gases.…”

Section: Introductionmentioning

confidence: 99%

Superhard NbB2− thin films deposited by dc magnetron sputtering

Nedfors

Tengstrand

et al. 2014

Surface and Coatings Technology

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We have deposited weakly textured substoichiometric NbB 2−x thin films by magnetron sputtering from an NbB 2 target. The films exhibit superhardness (42 ± 4 GPa), previously only observed in overstoichiometric TiB 2 thin films, and explained by a self-organized nanostructuring, where thin TiB 2 columnar grains hinder nucleation and slip of dislocations and a B-rich tissue phase between the grains prevent grain-boundary sliding. The wide homogeneity range for the NbB 2 phase allows a similar ultra-thin B-rich tissue phase to form between thin (5-10 nm) columnar NbB 2−x grains also for films with a B/Nb atomic ratio of 1.8, as revealed here by analytical aberration-corrected scanning transmission electron microscopy. Furthermore, a coefficient of friction of 0.16 is measured for an NbB 2−x film sliding against stainless steel with a wear rate of 5 × 10 −7 mm 3 /Nm. X-ray photoelectron spectroscopy results suggest that the low friction is due to the formation of a lubricating boric acid film.

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“…37 The exploration and utilization of TiB 2 (and other transition metal diborides) coatings and thin films have been stimulating fundamental and application-oriented research for decades, addressing chemical vapor deposition, [38][39][40][41][42] physical vapor deposition (PVD), [43][44][45][46] including, for example, ion beam assisted deposition, 47 magnetron sputtering, [48][49][50][51] arc evaporation, 52 and further synthesis methods. 53 In the following, the focus is on magnetron sputtering synthesis of transition metal diborides only, as this field has seen enormous innovation and progress through the development and implementation of new pulsed deposition techniques like pulsed DC magnetron sputtering, 49,[54][55][56] HIPIMS, [57][58][59][60][61] and combined DC magnetron sputtering and HIPIMS processes. 62,63 Further progress in transition metal diboride thin films development and processing is available through advanced simulation and modeling (for an introduction please see exemplarily Refs.…”

Section: Introductionmentioning

confidence: 99%

Magnetron sputtered NiAl/TiBx multilayer thin films

Wójcik

Ott

Özbilen

et al. 2022

Journal of Vacuum Science &Amp; Technology A

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Transition metal diboride-based thin films are currently receiving strong interest in fundamental and applied research. Multilayer thin films based on transition metal diborides are, however, not yet explored in detail. This study presents results on the constitution and microstructure of multilayer thin films composed of TiBx and the intermetallic compound NiAl. Single layer NiAl and TiBx and NiAl/TiBx multilayer thin films with a variation of the individual layer thickness and bilayer period were deposited by D.C. and R.F. magnetron sputtering on silicon substrates. The impact of the operation mode of the sputtering targets on the microstructure of the thin films was investigated by detailed compositional and structural characterization. The NiAl single layer thin films showed an operation mode-dependent growth in a polycrystalline B2 CsCl structure with a cubic lattice with and without preferred orientation. The TiBx single layer thin films exhibited an operation mode independent crystalline structure with a hexagonal lattice and a pronounced (001) texture. These TiBx layers were significantly Ti-deficient and showed B-excess, resulting in stoichiometry in the range TiB2.64–TiB2.72. Both thin film materials were deposited in a regime corresponding with zone 1 or zone T in the structure zone model of Thornton. Transmission electron microscopy studies revealed, however, very homogeneous, dense thin-film microstructures, as well as the existence of dislocation lines in both materials. In the multilayer stacks with various microscale and nanoscale designs, the TiBx layers grew in a similar microstructure with (001) texture, while the NiAl layers were polycrystalline without preferred orientation in microscale design and tended to grow polycrystalline with (211) preferred orientation in nanoscale designs. The dislocation densities at the NiAl/TiBx phase boundaries changed with the multilayer design, suggesting more smooth interfaces for multilayers with microscale design and more disturbed, strained interfaces in multilayers with nanoscale design. In conclusion, the volume fraction of the two-layer materials, their grain size and crystalline structure, and the nature of the interfaces have an impact on the dislocation density and ability to form dislocations in these NiAl/TiBx-based multilayer structures.

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Microstructure and mechanical property evaluation of pulsed DC magnetron sputtered Cr–B and Cr–B–N films

Cited by 29 publications

References 39 publications

Effects of Substrate Rotation Speed on Structure and Adhesion Properties of CrN/CrAlSiN Multilayer Coatings Prepared Using High-Power Impulse Magnetron Sputtering

Effects of Substrate Rotation Speed on Structure and Adhesion Properties of CrN/CrAlSiN Multilayer Coatings Prepared Using High-Power Impulse Magnetron Sputtering

Superhard NbB2− thin films deposited by dc magnetron sputtering

Magnetron sputtered NiAl/TiBx multilayer thin films

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