Microstructure and mechanical properties of Ti-Nb alloys: comparing conventional powder metallurgy, mechanical alloying, and high power impulse magnetron sputtering processes for supporting materials screening

Abstract

At the interface of thin film development and powder metallurgy technologies, this study aims to characterise the mechanical properties, lattice constants and phase formation of Ti-Nb alloys (8–30 at.%) produced by different manufacturing methods, including conventional powder metallurgy (PM), mechanical alloying (MA) and high power impulse magnetron sputtering (HiPIMS). A central aspect of this research was to investigate the different energy states achievable by each synthesis method. The findings revealed that as the Nb content increased, both the hardness and Young’s modulus of the PM samples decreased (from 4 to 1.5 and 125 to 85 GPa, respectively). For the MA alloys, the hardness and Young’s modulus varied between 3.2 and 3.9 and 100 to 116 GPa, respectively, with the lowest values recorded for 20% Nb (3.2 and 96 GPa). The Young’s modulus of the HiPIMS thin film samples did not follow a specific trend and varied between 110 and 138 GPa. However, an increase in hardness (from 3.6 to 4.8 GPa) coincided with an increase in the β2 phase contribution for films with the same chemical composition (23 at.% of Nb). This study highlights the potential of using HiPIMS gradient films for high throughput analysis for PM and MA techniques. This discovery is important as it provides a way to reduce the development time for complex alloy systems in biomaterials as well as other areas of materials engineering. Graphical abstract

Energy-Resolving Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis

“…Overall, E-TOFMS is a versatile tool for the analysis of complex plasma processes involving multiple energetic and chemical species, therefore in particular suitable for supporting development in thin film technology, where the IEDF for multiple ions is of interest. Examples of such areas include the development of high entropy alloy or compound films, where the energy of the impinging species influences the structure and microstructure of the grown film, ,,, or optimisation of thin film systems and interfaces in electronics, photovoltaics, and energy storage. The presented applications focus on PVD, specifically magnetron sputtering, however, it is likely that it will prove to be useful in the context of plasma enhanced chemical vapor deposition and atomic layer deposition (PE-CVD, PE-ALD) in general, where information on the IEDF and the nature of the ionic species involved in film growth are important for understanding the growth mechanism.…”