Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)Nx coatings

Shu, Rui; Paschalidou, Eirini‐Maria; Rao, Smita G.; Lu, Jun; Greczyński, Grzegorz; Lewin, Erik; Nyholm, Leif; Febvrier, Arnaud Le; Eklund, Per

doi:10.1016/j.surfcoat.2020.125651

Cited by 45 publications

(14 citation statements)

References 49 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Furthermore, at V bias ≤ −100 V, metal substitution does not induce a significant increase in hardness and elastic modulus compared with recent reports on HEN films showing values of 18−27 GPa. 9,20,32 The hardness value of 28 GPa for the (TiZrTaMe)N 1−x nitride film deposited at V bias = −100 V is significantly improved by ion bombardment but a bit lower than that of the (HfTaTaTiVZr)N coating deposited at V bias = −50 V (33.4 GPa). 41 The hardening at a higher negative bias is due to the densification of the films and increasing compressive stress.…”

Section: Resultsmentioning

confidence: 99%

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N_1–x (Me = Hf, Nb, Mo, or Cr) Films

Shu

Lundin

Xin

et al. 2021

ACS Appl. Electron. Mater.

Self Cite

View full text Add to dashboard Cite

Multicomponent or high-entropy ceramics show unique combinations of mechanical, electrical, and chemical properties of importance in coating applications. However, generalizing controllable thin-film processes for these complex materials remains a challenge. Here, understoichiometric (TiZrTaMe)N 1−x (Me = Hf, Nb, Mo, or Cr, 0.12 ≤ x ≤ 0.30) films were deposited on Si(100) substrates at 400 °C by reactive magnetron sputtering using single elemental targets. The influence of ion energy during film growth was investigated by varying the negative substrate bias voltage from ∼10 V (floating potential) to 130 V. The nitrogen content for the samples determined by elastic recoil detection analysis varied from 34.9 to 43.8 at. % (0.12 ≤ x ≤ 0.30), and the metal components were near-equimolar and not affected by the bias voltage. On increasing the substrate bias, the phase structures of (TiZrTaMe)N 1−x (Me = Hf, Nb, or Mo) films evolved from a polycrystalline fcc phase to a (002) preferred orientation along with a change in surface morphology from faceted triangular features to a dense and smooth structure with nodular mounds. All the four series of (TiZrTaMe)N 1−x (Me = Hf, Nb, Mo, or Cr) films exhibited increasing intrinsic stress with increasing negative bias. The maximum compressive stress reached ∼3.1 GPa in Hf-and Cr-containing films deposited at −130 V. The hardness reached a maximum value of 28.0 ± 1.0 GPa at a negative bias ≥100 V for all the four series of films. The effect of bias on the mechanical properties of (TiNbZrMe)N 1−x films can thus guide the design of protective high-entropy nitride films.

show abstract

Section: Resultsmentioning

confidence: 99%

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N_1–x (Me = Hf, Nb, Mo, or Cr) Films

Shu

Lundin

Xin

et al. 2021

ACS Appl. Electron. Mater.

Self Cite

View full text Add to dashboard Cite

show abstract

“…However, in one case, the amount of Al was significantly altered by a high (negative) bias value, 47 and also, the N-content has in at least one case been strongly influenced by the substrate temperature. 33…”

Section: Journal Of Applied Physicsmentioning

confidence: 99%

Multi-component and high-entropy nitride coatings—A promising field in need of a novel approach

Lewin

2020

Journal of Applied Physics

Self Cite

100

View full text Add to dashboard Cite

Multi-component and high-entropy nitrides are a growing field with a promise of new functional materials. The interest in the field was sparked by the adjacent field of high-entropy and multi-component alloys, and the promise consists of both demonstrated properties and a possibly very large freedom for materials design. These promises, however, also come with new challenges connected to the vast available experimental space, which is inherent in multi-component materials. Traditional materials science methodologies will be slow to make appreciable progress in such an environment. A novel approach is needed to meet the challenges of the hyperdimensional compositional space. Recent developments within the fields of information technology can give materials science the tools needed. This Perspective article summarizes the state of the art in the field of multi-component nitride materials, focusing on coatings where solid solution phases with simple crystal structures are formed. Furthermore, it outlines the present research challenges that need to be addressed to move the field forward and suggests that there is a need to combine the traditional knowledge-driven materials science methodology with new data-driven methodologies. The latter would include advanced data-handling with artificial intelligence and machine learning to assist in the evaluation of large, shared datasets from both experimental and theoretical work. Such a change in the methodology will be a challenge but will be needed in order to fully realize the full potential of multi-component (nitride) materials.

show abstract

“…One common class of methods is physical vapour deposition, such as thermal or electron beam evaporation, cathodic arc deposition, ion-plating, ion beam sputtering, pulsed laser deposition and various types of sputtering processes. Among these, the physical vapor deposition techniques including magnetron sputtering [66][67][68][69] , and cathodic arc deposition [39,70] are utilized for the fabrication of multicomponent nitride films. Chemical vapor deposition (CVD) is another versatile technique to deposit high-quality films by gas chemical reaction with each other.…”

Section: Thin Film Deposition and Growthmentioning

confidence: 99%

Nonstoichiometric Multicomponent Nitride Thin Films

Shu

2020

Linköping Studies in Science and Technology. Licentiate Thesis

Self Cite

View full text Add to dashboard Cite

High entropy ceramics have rapidly developed as a class of materials based on high entropy alloys; the latter being materials that contain five or more elements in near-equal proportions. Their unconventional compositions and chemical structures hold promise for achieving unprecedented combinations of mechanical, electrical and chemical properties. In this thesis, high entropy ceramic films, (TiNbZrTa)Nx were deposited using reactive magnetron sputtering with segmented targets. The stoichiometry x was tuned with two deposition parameters, i.e., substrate temperature and nitrogen flow ratio fN, their effect on microstructure and mechanical, electric, and electrochemical properties were investigated.

show abstract

Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)Nx coatings

Cited by 45 publications

References 49 publications

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N_1–x (Me = Hf, Nb, Mo, or Cr) Films

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N_1–x (Me = Hf, Nb, Mo, or Cr) Films

Multi-component and high-entropy nitride coatings—A promising field in need of a novel approach

Nonstoichiometric Multicomponent Nitride Thin Films

Contact Info

Product

Resources

About

Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)Nx coatings

Cited by 45 publications

References 49 publications

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N1–x (Me = Hf, Nb, Mo, or Cr) Films

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N1–x (Me = Hf, Nb, Mo, or Cr) Films

Multi-component and high-entropy nitride coatings—A promising field in need of a novel approach

Nonstoichiometric Multicomponent Nitride Thin Films

Contact Info

Product

Resources

About

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N_1–x (Me = Hf, Nb, Mo, or Cr) Films

Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N_1–x (Me = Hf, Nb, Mo, or Cr) Films