Microstructural modification of metallic thin films via high-frequency alternating current treatment at room temperature
Shaojie Gu,
Boran Zhang,
Yasuhiro Kimura
et al.
Abstract:This study comprehensively investigates the effects of high-frequency alternating current (AC) on the adhesion strength between metallic thin films and substrates as well as on the resistivity of metallic films. Under AC treatment at the optimal frequencies of 26, 37, and 38 MHz, the adhesion strengths of the Al, Cu, and Pt films to a substrate increase by 44.9%, 42.0%, and 101.8%, respectively, whereas their resistivities decrease by 22.6%, 38.4%, and 8.1%, respectively, at optimal frequencies of 30, 40, and … Show more
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