2021
DOI: 10.1016/j.surfcoat.2020.126593
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Microstructural, mechanical, thermal stability and oxidation behavior of TiSiN/CrV N multilayer coatings deposited by D.C. reactive magnetron sputtering

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Cited by 16 publications
(8 citation statements)
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“…Moreover, Si contents above 10 at. % exhibit very broad diffraction peaks that are associated with the low crystallinity degree [18,28]. Based on the results of WDS analysis, the Si concentration in the monolithic TiSiN coatings and WN x /TiSiN multilayer is 8.1 at.…”
Section: Cross-sectionsmentioning
confidence: 99%
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“…Moreover, Si contents above 10 at. % exhibit very broad diffraction peaks that are associated with the low crystallinity degree [18,28]. Based on the results of WDS analysis, the Si concentration in the monolithic TiSiN coatings and WN x /TiSiN multilayer is 8.1 at.…”
Section: Cross-sectionsmentioning
confidence: 99%
“…The difference between lattice parameters of two individual layers (according to the ICSD database, for a W and a TiN is 3.159 nm and 4.244 nm, respectively) contributes to the broadening of the XRD diffraction peaks. In addition, the presence of a gradient interface between the individual layers in the multilayer design contributes to the diffraction peaks broadening as well [18].…”
Section: Cross-sectionsmentioning
confidence: 99%
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“…Transition metal nitrides-based thin films have been widely used for improving the hardness and wear resistance properties [39][40][41][42][43][44][45]. Moreover, they also provide enhanced corrosion and oxidation resistance properties even at high temperatures [46][47][48]. Chromium (Cr), Titanium (Ti), tungsten (W) based binary and ternary alloy and multilayer thin films have shown enhanced hardness of around ∼25-35 GPa whereas they have also reflected good oxidation resistance properties up to ∼500 °C-600 °C [49,50].…”
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confidence: 99%