Microstructural investigations of 800 keV Ar ions irradiated nanocrystalline ZrN thin films

Abstract

The effect of 800 keV Ar ion irradiation on the microstructure and composition of ZrN films grown by pulsed laser deposition technique was investigated. Grazing incidence and symmetrical X-ray diffraction showed films were nanostructured, with grain size around 13 nm and (111) textured. X-ray reflectivity investigations showed a 0.7% decrease of films density after irradiation with a fluence of 1 × 10 14 cm −2 and no further decreased for a fluence of 1 × 10 15 cm −2 . An increase of the lattice parameter and a decrease of grain size after irradiation with a fluence of 1 × 10 14 cm −2 was observed and almost no change after irradiation with a fluence of 1 × 10 15 cm -2 . X-ray photoelectron spectroscopy investigations did not detect changes in the composition of films after irradiation. Transmission electron microscopy studies confirmed that the films were nanocrystalline, compact, with columnar crystallites without pores or voids. After irradiation, the microstructure was not affected and no other phases appeared.

Microstructure and Corrosion Behavior of the Modified Layers Grown In Situ by Plasma Nitriding Technology on the Surface of Zr Metal

“…XPS was used to analyze the composition of the modified layers, and the split-peak fitting was carried out. All of the spectroscopies were corrected with a 284.6 eV peak of the C element, as was performed in other works about ZrN [12,34,35,42]. Figure 4a-c present the Zr3d high resolution XPS of the samples prepared at 0.4 A/100 min, 0.6 A/60 min and 0.8 A/60 min, respectively.…”

“…Compared with TiN and other metal nitrides, ZrN shows better mechanical and frictional properties and oxidation resistance [9,10]. Of course, nanocrystalline ZrN film is also considered as an ATF coating due to its high irradiation resistance [11,12]. The preparation of ZrN coatings with compact structure and excellent interface bonding strength is essential to protect the zirconium alloy.…”

Hard x-ray photoelectron spectroscopy: a snapshot of the state-of-the-art in 2020

“…It also houses a dual beam charge neutralisation setup using a low energy electron beam and ion beam (ULVAC-PHI) and a connected magnetron sputtering deposition system (Chemitronics) for in situ characterisation. [120][121][122] One of the most recent additions to the family of Cr Kα-based HAXPES systems has been constructed and commissioned at Temple University (USA). The heart of the system is a custom-built high-flux monochromated 5.4 keV hard X-ray microfocus source, consisting of a 30 kV focused electron gun (Kimball Physics), a water-cooled thin-film Cr anode, and a large bent-crystal Ge (411) monochromator in a 730 mm Rowland circle geometry.…”

“…Kochi University of Technology, Japan, has a double x-ray source laboratory HAXPES system, which combines monochromated Cr Kα and Al Kα x-ray sources from ULVAC-PHI with a Scienta Omicron EW4000 analyser. It also houses a dual beam charge neutralisation setup using a low energy electron beam and ion beam (ULVAC-PHI) and a connected magnetron sputtering deposition system (Chemitronics) for in situ characterisation [120][121][122].…”

Microstructure and properties of nanocrystalline Cu–Ta thin films prepared by direct current magnetron sputtering

“…In recent years, nanocrystalline (NC) materials have attracted widespread attention due to their excellent mechanical [1][2][3][4][5][6][7], electrical [8,9], magnetic [9,10], and radiation tolerance [7,11] properties. Experimental results have demonstrated that NC materials can be produced by equal-channel angular pressing [12], high-pressure torsion [13,14], mechanical alloying [15][16][17], and nanoindentation [18].…”