Microstructural Investigation of CoCrFeMnNi High Entropy Alloy Oxynitride Films Prepared by Sputtering Using an Air Gas

Le, Duc C.; Hong, Sung-Tae; Ngo, Trong Si; Lee, Jeongkuk; Park, Yun Chang; Hong, Sun Ig; Na, Young Sang

doi:10.1007/s12540-018-0143-2

Cited by 15 publications

(4 citation statements)

References 31 publications

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“…The high stability of TiZrHfNbTaO6N3 is partly because of the entropy-stabilization concept which leads to low Gibbs free energy in the presence of a large number of elements [14,15]. This high stability is an important issue that has led to the utilization of high-entropy ceramics for various applications with superior performance [14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31][32][33].…”

Section: Resultsmentioning

confidence: 99%

“…A combination of the perception of metal oxynitrides as low bandgap photocatalysts and high-entropy ceramics as highly stable materials can be a new strategy to expand the application of oxynitrides for photocatalytic CO2 conversion. Although high-entropy oxynitrides (HEONs) were successfully synthesized in a few studies [32,33], there are no reports on the photocatalytic performance of HEONs for CO2 photoreduction.…”

Section: Introductionmentioning

confidence: 99%

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Significant CO2 photoreduction on a high-entropy oxynitride

Akrami

Edalati

Shundo

et al. 2022

Chemical Engineering Journal

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Significant CO2 photoreduction on a high-entropy oxynitride

Akrami

Edalati

Shundo

et al. 2022

Chemical Engineering Journal

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“…It is known to be effective in optimizing the microstructure and mechanical properties of HEA and high entropy nitride (HEN) films by controlling the process parameters, such as sputtering power, substrate temperature, reactive gas flow ratio, and process pressure [23][24][25]. Especially, controlling the reactive gas (N 2 or O 2 ) flow ratio can easily produce various high entropy nitride (or oxide) films [26,27]. It has been reported that Chen at al.…”

Section: Introductionmentioning

confidence: 99%

Structural and Mechanical Properties of AlCoCrNi High Entropy Nitride Films: Influence of Process Pressure

et al. 2019

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In the present study, novel AlCoCrNi high entropy nitride (HEN) films were deposited on Si substrate by a reactive direct current magnetron sputtering system. In order to investigate the influence of sputtering parameters on the microstructure and mechanical properties of the film, nitrogen flow ratio (RN: 25–100%) and process pressure (1.33 × 10−1–1.33 Pa) were controlled, respectively. All the films were identified as an amorphous phase with composition of near equiatomic ratios, regardless of the conditions of nitrogen flow ratios and process pressures. However, the limited mechanical properties were found for the films deposited under different nitrogen flow ratios with retaining the process pressure of 1.33 Pa. To enhance the mechanical properties of the AlCoCrNi HEN film, process pressure was adjusted. From the transmission electron microscopy (TEM) observation, the structure of the film deposited at the process pressure of 1.33 Pa is identified as a porous and open structure with a number of density-deficient boundary and nano-scale voids. On the other hand, densified morphology of the film was observed at pressure of 1.33 × 10−1 Pa. As a result, the hardness, elastic modulus, and H/E were improved up to 16.8, 243 GPa, and 0.0692, respectively.

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“…Among the large number of high-entropy alloys, some emphasis has been placed on the interesting of CoCrFeMnNi high-entropy alloy, the equiatomic CoCrFeMnNi high-entropy alloy demonstrates high thermodynamic stability, remarkable work hardening capacity, excellent ductility and superior corrosion resistance [10][11][12][13]. Until now, many methods were put forward to the preparation of CoCrFeMn-Ni bulk solids or coatings, such as arc-melting method, powder metallurgy, magnetron sputtering, laser cladding, electrochemical synthesis and so on [13][14][15][16][17][18][19][20][21][22]. To successfully fabricate homogenous bulk or coatings by powder metallurgy or laser cladding, it is especially important to synthesis high-entropy alloy powders with a good homogeneous microstructure.…”

Section: Introductionmentioning

confidence: 99%

CoCrFeMnNi high‐entropy alloy powder with excellent corrosion resistance and soft magnetic property prepared by gas atomization method

Jin¹,

Gu²,

Feng

et al. 2019

Materialwissenschaft Werkst

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To successfully fabricate high‐entropy alloys by powder metallurgy, laser cladding, or thermal sprayed method, the high‐entropy alloy powders possessing good homogeneous microstructure are very important. However, the study on the properties of the high‐entropy alloy powder has still been lacking. In this work, an equiatomic CoCrFeMnNi high‐entropy alloy powder with spherical shape was synthesized by gas atomization method. The as‐atomized CoCrFeMnNi high‐entropy alloy powder is composed of a single face‐centered cubic solid solution phase with the particle size of 34.0 μm. Furthermore, the as‐atomized powder exhibits excellent corrosion resistance in 10 % hydrochloric acid solution to 304 L stainless steel powder, and also shows an excellent soft magnetic behavior. Therefore, the gas atomization method can be used to generate other kinds of high‐entropy alloy powders for many challenging industrial applications.

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Microstructural Investigation of CoCrFeMnNi High Entropy Alloy Oxynitride Films Prepared by Sputtering Using an Air Gas

Cited by 15 publications

References 31 publications

Significant CO2 photoreduction on a high-entropy oxynitride

Significant CO2 photoreduction on a high-entropy oxynitride

Structural and Mechanical Properties of AlCoCrNi High Entropy Nitride Films: Influence of Process Pressure

CoCrFeMnNi high‐entropy alloy powder with excellent corrosion resistance and soft magnetic property prepared by gas atomization method

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