Microstructural and opto-electrical properties of chromium nitride films implanted with vanadium ions

Abstract

We report on modifications of 280-nm thin polycrystalline CrN layers caused by vanadium ion implantation. The CrN layers were deposited at 150 • C by d.c. reactive sputtering on Si(100) wafers and then implanted at room temperature with 80-keV V + ions to fluences of 1 × 10 17 and 2 × 10 17 ions/cm 2 . Rutherford backscattering spectroscopy, cross-sectional transmission electron microscopy, and X-ray diffraction were used to characterize changes in the structural properties of the films. Their optical and electrical properties were analyzed by infrared spectroscopy in reflection mode and electrical resistivity measurements. CrN was found to keep its cubic structure under the conditions of vanadium ion implantation used here. The initially partially non-metallic CrN layer displays metallic character under implantation, which may be related to the possible formation of Cr 1−x V x N.