Microstructural and nanomechanical studies of PVD Cr coatings on SiC for LWR fuel cladding applications

Quillin, Kyle; Yeom, Hwasung; Dabney, Tyler; Willing, Evan; Sridharan, Kumar

doi:10.1016/j.surfcoat.2022.128577

Cited by 13 publications

(2 citation statements)

References 53 publications

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“…This is also attributed to the columnar crystal structure of the nanocrystalline coating (Fig. 2f), which is an inevitable morphology of the coating obtained by physical vapor deposition [35][36][37] . The spacing between the columnar crystals of the tantalum coating can reach about 20 nm 7 , which provides space for the volume expansion generated by the Ta 2 O 5 oxidation process, causing the oxide film to gradually densify, resulting in relatively slow oxygen diffusion behavior, as shown in Fig.…”

Section: Short-time Oxidation Mechanism Of Nanocrystalline Ta Coatingmentioning

confidence: 99%

Short-time high-temperature oxidation behavior of nanocrystalline Ta coating at 850 °C

Niu,

Xing,

Zhu

et al. 2024

npj Mater Degrad

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Short-time oxidation behavior of nanocrystalline Ta coating is studied at 850 °C in comparison with that of the Ta sheet. Owing to the large PBR value and insufficient expansion space, the oxide scale on Ta sheet is dramatically cracked, delaminated and pulverized, resulting in rapid deterioration. For nanocrystalline Ta coatings with columnar structures and quantitative grain boundaries, a rapid oxygen diffusion rate causes no initial Ta2O5 to form. The gap between columns provides spaces for bulk expansion, resulting in few opening cracks and delamination. Ta oxidation experiences a crystallization course from amorphous Ta oxide, leading to in situ temperature surging and thus pulverization.

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Section: Short-time Oxidation Mechanism Of Nanocrystalline Ta Coatingmentioning

confidence: 99%

Short-time high-temperature oxidation behavior of nanocrystalline Ta coating at 850 °C

Niu,

Xing,

Zhu

et al. 2024

npj Mater Degrad

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show abstract

“…It was used successfully to improve the deposition of different types of films, e.g. to increase the deposition rate [8,9], to improve hardness [10][11][12][13][14], strengthen film adhesion [8,15,16], for film densification [14,17], to smoothen the film surface [12,15], to increase grain sizes [13,17], to rise the content of sp 3 bonds in diamond-like carbon films [9,12,18,19], and to minimize porosity [17].…”

Section: Introductionmentioning

confidence: 99%

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Pajdarová,

Kozák,

Tölg

et al. 2024

Plasma Sources Sci. Technol.

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Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35mm, 60mm, and 100mm) was carried out during long positive voltage pulses (a duration of 500μs and a preset positive voltage of 100V) in bipolar High-Power Impulse Magnetron Sputtering of a Ti target (a diameter of 100mm) using an unbalanced magnetron. Fast-camera spectroscopy imaging recorded light emission from Ar and Ti atoms and singly charged ions during positive voltage pulses. It was found that during the long positive voltage pulse, the floating and the plasma potentials suddenly decrease, which is accompanied by the presence of anode light located on the discharge centerline between the target center and the magnetic null of the magnetron's magnetic field. These light patterns are related to the ignition of a reverse discharge, which leads to the subsequent rise in the plasma and the floating potentials. The reversed discharge is burning up to the end of the positive voltage pulse, but the plasma and floating potentials have lower values than the values from the initial part of the positive voltage pulse. Secondary electron emission induced by the impinging Ar+ ions to the grounded surfaces in the vicinity of the discharge plasma together with the mirror configuration of the magnetron magnetic field are identified as the probable causes of the charge double-layer structure formation in front of the target and the ignition of the reverse discharge.

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Comparative Machinability Aspects of Austenitic and Duplex Stainless Steels During Dry Turning

Sonawane,

Bachhav,

Kulkarni

2024

JOM

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Microstructural and nanomechanical studies of PVD Cr coatings on SiC for LWR fuel cladding applications

Cited by 13 publications

References 53 publications

Short-time high-temperature oxidation behavior of nanocrystalline Ta coating at 850 °C

Short-time high-temperature oxidation behavior of nanocrystalline Ta coating at 850 °C

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge

Comparative Machinability Aspects of Austenitic and Duplex Stainless Steels During Dry Turning

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