2006
DOI: 10.1016/j.surfcoat.2005.11.015
|View full text |Cite
|
Sign up to set email alerts
|

Microstructural and mechanical investigations of tungsten carbide films deposited by reactive RF sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

1
18
0

Year Published

2009
2009
2022
2022

Publication Types

Select...
7
1
1

Relationship

0
9

Authors

Journals

citations
Cited by 37 publications
(23 citation statements)
references
References 23 publications
1
18
0
Order By: Relevance
“…On the other hand, it has a low friction coefficient. The WC coating can be deposited on the substrate material by magnetron sputtering, including a direct current magnetron sputtering (DC MS) technique [3][4][5][6][7][8][9][10][11][12][13] and a radio frequency magnetron sputtering (RF MS) technique [14][15][16][17][18][19][20][21][22][23][24]. Moreover, WC coatings can be deposited with a low-pressure and low-temperature plasma system, where tungsten carbonyl is used as a precursor [25][26][27][28][29] and it enables the temperature to decrease near to 300 °C [19].…”
Section: Introductionmentioning
confidence: 99%
“…On the other hand, it has a low friction coefficient. The WC coating can be deposited on the substrate material by magnetron sputtering, including a direct current magnetron sputtering (DC MS) technique [3][4][5][6][7][8][9][10][11][12][13] and a radio frequency magnetron sputtering (RF MS) technique [14][15][16][17][18][19][20][21][22][23][24]. Moreover, WC coatings can be deposited with a low-pressure and low-temperature plasma system, where tungsten carbonyl is used as a precursor [25][26][27][28][29] and it enables the temperature to decrease near to 300 °C [19].…”
Section: Introductionmentioning
confidence: 99%
“…It is these characteristics of WC which improve the other properties of materials [13]. WC layers have been deposited using chemical vapor deposition (CVD) [14][15][16][17][18][19][20][21][22] and physical vapor deposition (PVD) techniques [1][2][3][4][5][6][7][8][9][10][11][12][13][23][24][25][26][27][28][29][30][31]. Plasma enhanced CVD of tungsten hexacarbonyl has also been used for the deposition of WC/C layers at lower temperatures compared to those used in CVD techniques [15][16][17][18][19][20][21].…”
Section: Introductionmentioning
confidence: 99%
“…WC creates β-W 2 C [7,24] and β-WC 1-x [7,24,29] phases where the individual forms of C and WC have different indentation of hardness (H), indentation modulus (E) and COF. Various factors which influence the formation of both phases are as follows: the deposited substrate surface temperature [3,8,11,12,23]; applied pressure and bias voltage [4,24,27,28]; content of carbon in the layers [1,6,8,23]; the flow rate and composition of the precursor [3,4,6,29], and residual stress in the layers [26]. Monocrystalline Si substrate is used to test structural properties under laboratory conditions [27][28][29][30].…”
Section: Introductionmentioning
confidence: 99%
“…[23][24][25][26][27][28] The present study is of interest both for fundamental reasons and for technological applications. This nanostructured system material has been rather investigated previously, either in the form of nanocomposite or multilayer, for the improvement of the tribological performance and hardness.…”
Section: Introductionmentioning
confidence: 99%