Microstructural Analysis of W-Doped TiO₂ Thin Films Deposited by Sputtering

Abstract

The paper presents results of synthesis and characterization of TiO2 thin films doped with low percentages of tungsten using the magnetron co-sputtering technique. The influence of tungsten concentration on the structure, hardness and electrical resistivity was analyzed using different characterization techniques such as X-ray diffraction, FE-SEM, EDS, Vickers hardness testing and Keithley high-strength electrometer. The deposits were synthesized in an inert atmosphere at room temperature. Subsequent, post-deposit thermal treatments were used at 500 ° C for 3 hours. The presence of the rutile and anatase phases were identified by XRD, where rutile was majority. The surface morphology was analyzed using FE-SEM where clusters of small particles with a size of 10 nm could be observed. Vickers hardness values reached 21.70 GPa, while electrical resistivity values showed a highly resistive behavior of 2.57 x1011 Ω.sq, which allows this material to be an excellent candidate for corrosion protection.

Microhardness, Resistivity and Tribological Properties of Coatings Based on Hf/Hfn Bilayers Deposited By Sputtering

“…The hardness of the coatings was evaluated in a Vickers microhardness tester Mitutoyo model HM-125 by applying the following load values of 0.003, 0.004, 0.005, 0.01, 0.025, 0.05, 0.1, 0.2, 0.3, 0.5, 1.0 and 2.0 Kg f , with a loading time of 15 seconds. Once the hardness value was obtained for each loading value, the Korsunsky indentation model (12,13)was implemented to estimate the hardness value of the coatings.…”

“…To evaluate the electrical resistivity of the surface, the Model 8009 resistivity test device coupled to a Keithley high resistance electrometer/meter was used. Different DC voltages of 5, 10, 20, 20, 20, 35 and 50 V were applied (13).…”