Micromirror array allocation algorithm based on deconvolution

Liu, Zhifan; Yang, Chunyan; Yang, Bojun; Li, Sikun; Zhang, Jianhua; Wang, Xiangzhao; Sun, Gang

doi:10.1364/ao.389891

Cited by 3 publications

(1 citation statement)

References 20 publications

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“…In illumination system of lithography, the MMA is employed for the generation of optimal freeform illumination modes. The MMA consists of thousands of biaxial rotary micromirrors and reflects faculae to the designated positions in the customized illumination mode [6,7] . In order to generate ideal illumination modes, mirrors are actuated in a sufficient angle range of 2° with a angular error of less than 0.002°.…”

Section: Introductionmentioning

confidence: 99%

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

Zhang,

Hu,

Zeng

et al. 2023

AOPC 2023: Optical Design and Manufacturing

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Section: Introductionmentioning

confidence: 99%

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

Zhang,

Hu,

Zeng

et al. 2023

AOPC 2023: Optical Design and Manufacturing

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Angle monitor of micromirror array for freeform illumination in lithography systems

Zhang,

Hu,

Yang

et al. 2024

AIP Advances

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Source and mask optimization is a critical technique for further resolution enhancement in immersion lithography systems, wherein the optimal illumination source shape is widely generated by the micromirror array. Accordingly, the accurate achievement of the allocated angles of micromirrors is a key prerequisite for the implementation of arbitrary illumination patterns. In this paper, we propose an angle monitor to ensure the high-precision tilting of thousands of biaxial micromirrors. As one of the critical modules for closed-loop control of the two-dimensional micromirror array, the online monitor feeds the monitored high-precision tilt angle back to the processing system. The angle monitor mainly consists of the spot scanning module and the angle detection module. Among them, an f-θ lens and a Fourier transform lens with satisfied performances are designed and evaluated by CODE V. Furthermore, a galvanometer and the designed f-θ lens are adopted for the generation of the spot array irradiated on the electrostatic actuated mirrors. Meanwhile, the designed Fourier transform lenses are employed to detect the corresponding tilt angles. In addition, the performance of the proposed system is identified by simulations and experiments individually. It is demonstrated that the monitorable biaxial tilt range of the system is (−2.5°, +2.5°) with a repeatability of better than 0.005°. The large-format micromirror array can be monitored completely without optical cross-talk. Through the device, a 16 × 16 micromirror array is monitored, where the initial angle with no bias voltage applied is captured and the voltage–angle relation for individual micromirrors is obtained. In general, the proposed system can be utilized in the illumination system, providing an efficient and reliable method for complex source shape generation.

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High efficiency regulation method to generate an illumination source by adopting the micromirror array in DUV lithography

Chen,

Li,

Liu

2024

Appl. Opt.

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Source and mask optimization (SMO) is an important lithography resolution enhancement technique for 22 nm technology nodes and beyond in lithography. This technique generates freeform sources by adjusting the inclination angle of the micromirror array (MMA). In this paper, a high efficiency regulation method to generate an illumination source by adopting the micromirror array in DUV lithography is proposed. The number and inclination angles of micromirrors required for adjustment to convert the initial source into any illumination source are quickly and accurately obtained by using the proposed method. The illumination source is obtained on the pupil plane by adjusting the inclination angles of some micromirrors. The simulation results show that the initial source is converted into another illumination source with different complexities by adjusting some micromirrors. Compared with the traditional MMA allocation method, when the initial source is the freeform source, the regulation efficiency of micromirrors has been improved by at least 20%. The method reduces the regulation time of micromirrors and the number of micromirrors required for adjustment. Moreover, the number of micromirrors required for adjustment is positively correlated with the coherence coefficient. The results illustrate that this method is effective and has significant engineering implications.

show abstract

Micromirror array allocation algorithm based on deconvolution

Cited by 3 publications

References 20 publications

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

Angle monitor of micromirror array for freeform illumination in lithography systems

High efficiency regulation method to generate an illumination source by adopting the micromirror array in DUV lithography

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