Microminiaturized Fuel Elements by Vapor-Deposition Techniques

Oxley, J.H.; Browning, M.F.; Veigel, N. D.; Blocher, J.M.

doi:10.1021/i360002a009

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1965

2002

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Cited by 6 publications

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“…Large atomic masses are of interest "for thruster application due to the increase of thrust per beam ion with ion mass. This source has, however, been operated with a variety of gases (6) and molecular types (7). In addition, the electron-bombardment thruster has demonstrated extremely long term, stable operation (8).…”

Section: Introductionmentioning

confidence: 99%

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Chromium Coatings Prepared by Chemical Vapor Deposition

Wakefield

1969

J. Electrochem. Soc.

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The formation by chemical vapor deposition (CVD) of chromium metal as coatings on various substrates was studied using the reaction CrCl2+H2→normalCr+2normalHCl Process parameters of temperature, gas flow rate, and chromium chloride concentration influenced the deposition rate. The chromium metal deposited had properties similar to high‐purity “iodide” chromium. Surface appearance and grain structure differed from materials such as titanium, deposited in earlier studies. This is suggested to result from difference in the controlling mechanism of the reduction reaction and evidence for this mechanism was observed.

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Section: Introductionmentioning

confidence: 99%

“…Preparation of unalloyed chromium coatings has been carried out (6) by the thermal dissociation of organochromium compounds such as dicumene chromium, Cr[C6H~CH(CH~)2]. Because of their low boiling points, use of such compounds is a convenient procedure for obtaining chromium in a vapor state, and the compounds can be decomposed at moderate temperatures.…”

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confidence: 99%