Micromachined thick permanent magnet arrays on silicon wafers

Liakopoulos, T.M.; Zhang, Wenjin; Ahn, Chong H.

doi:10.1109/20.539521

Cited by 45 publications

(24 citation statements)

References 6 publications

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“…6, increases with increasing aspect ratio, reaching values as high as 5.38 MGOe (42.83 kJ/m , in the range studied. The data reported in this paper are either comparable to the data obtained by other groups for permanent magnets [8] or superior to data reported on electrodeposited micromagnets [3].…”

Section: Methodssupporting

confidence: 91%

“…However, the potential miniaturization of these components is limited by the hybrid processes generally used for their fabrication, which increase their cost and limit their performance. Efforts to develop CMOS-compatible processes for the production of integrated micromagnets have been limited until now to the production of thin rare earth-transition metal (RE-TM) films [2] by sputtering, or to electrodeposited Co-based alloys with relatively low anisotropy [3]. Although RE-TM magnetic materials provide the highest energy products currently achievable, the synthesis of hard magnetic thick films requires high deposition temperatures that are incompatible with the CMOS processes.…”

Section: Introductionmentioning

confidence: 99%

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Electrodeposited Co-Pt permanent micromagnet arrays on Cu[111]-Si[110] substrates

Zana

Zangari

2002

IEEE Trans. Magn.

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Co-Pt cylindrical micromagnets with 2-m diameter have been successfully fabricated by electroplating through resist masks onto Cu(111) seed layers. The influence of the applied current density and cylinder height on the magnetic properties have been investigated. Both coercivity and retentivity increase with increasing aspect ratio, due to the combined effect of the decreasing demagnetizing field and the increasing perpendicular crystalline anisotropy of Co-Pt, which grows preferentially with HCP(0001) orientation. Values as high as 4.3 kOe for the coercivity and 6.9 kG for retentivity have been observed. Large energy products up to 5.38 MGOe (42.83 kJ/m 3 ) were attained, rendering these structures potential candidates for hard magnetic components in microelectromechanical systems.

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Section: Methodssupporting

confidence: 91%

Section: Introductionmentioning

confidence: 99%

Electrodeposited Co-Pt permanent micromagnet arrays on Cu[111]-Si[110] substrates

Zana

Zangari

2002

IEEE Trans. Magn.

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“…ifi (5) Tmech KOIIH(f)I (6) where K is the spring stiffness for the scanner, I is the scan mirror inertia, C is the mechanical scan angle, and Ho) is the modulus of the scanner transfer function at the operation frequency.…”

Section: Frequency and Torque Requirementsmentioning

confidence: 99%

<title>High-frequency raster pinch correction scanner for retinal scanning displays</title>

et al. 2001

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High-resolution (i.e., large pixel-count) and high frame rate dynamic microdisplays can be implemented by scanning a photon beam in a raster format across the viewer's retina. A resonant horizontal scanner and a linearly driven vertical scanner can create a 2-D raster for video display. The combined motion of the two scanners form a sinusoidal raster in the vertical direction and cause non-uniform line spacing for the case of bidirectional scanning as if the forward and return half-period raster lines are "pinched" near the edge of the display screen. 'Raster pinch" effect degrades the image quality, especially for multi-beam scanning systems. What is needed is a vertical scanner that creates a stairstep motion instead of linear motion. A third scanner can be added to the system to create an approximation to a staircase motion in the vertical axis and correct for the non-uniform raster spacing. The raster pinch scanner requirements, mechanical and magnetic designs with FEA analysis, and preliminary test results are discussed in this paper.

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“…Even though singlecrystal Silicon is anisotropic, some of the MEMS literature use =1 in the above expressions for computing torsional stiffness for Silicon [10][11][12][13][14] . Using the correct 1.248 for <100> Silicon in our new formula improves the accuracy of the torsional stiffness computation by as much as 20 % in some cases.…”

Section: Scanner Natural Vibration Modesmentioning

confidence: 99%

MEMS scanners for display and imaging applications

Ürey

2004

Optomechatronic Micro/Nano Components, Devices, and Systems

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Dynamic display and imaging applications demand high performance scanners, which has high frequency (exceeding10KHz), large scan-angle-mirror-size product (> 10deg.mm), good optical surface quality (< /20 static and dynamic flatness), high sensitivity position sensors, and high-torque actuators that are compact and low power. This paper discusses the resolution and other optical performance requirements for diffraction-limited and non-diffractionlimited light sources in a scanning system. A set of analytical formulas is presented for calculating the torsion and other four fundamental oscillation mode vibration frequencies. The formulas include the effects of material anisotropy in orthotropic materials, such as Silicon and effective mass and inertia of the flexures. The validity range of formulas are extended by introducing a correction factor based on flexure width and flexure length ratios. The formulas are very efficient for performance trades and optimization. For scanner actuation, we present two compact scanner actuation mechanisms: out-of-plane comb actuator and novel two-coil electromagnetic actuator.

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Micromachined thick permanent magnet arrays on silicon wafers

Cited by 45 publications

References 6 publications

Electrodeposited Co-Pt permanent micromagnet arrays on Cu[111]-Si[110] substrates

Electrodeposited Co-Pt permanent micromagnet arrays on Cu[111]-Si[110] substrates

<title>High-frequency raster pinch correction scanner for retinal scanning displays</title>

MEMS scanners for display and imaging applications

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