2016
DOI: 10.1088/0960-1317/26/11/113001
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Micromachined high-performance RF passives in CMOS substrate

Abstract: This review systematically addresses the micromachining technologies used for the fabrication of high-performance radio-frequency (RF) passives that can be integrated into low-cost complementary metal-oxide semiconductor (CMOS)-grade (i.e. low-resistivity) silicon wafers. With the development of various kinds of post-CMOS-compatible microelectromechanical systems (MEMS) processes, 3D structural inductors/transformers, variable capacitors, tunable resonators and band-pass/low-pass filters can be compatibly inte… Show more

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Cited by 5 publications
(5 citation statements)
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References 101 publications
(121 reference statements)
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“…Figure 6 Table 2 shows the densities of these samples measured by the Archimedean method and the calculated ideal densities and porosities. The measured density of the AN sample is 2.06 g/cm 3 and the porosity of this sample was approximately 23.4%. As for the ANc sample, the measured density was 2.31 g/cm 3 and the porosity was 13.5%.…”
Section: Resultsmentioning
confidence: 93%
See 2 more Smart Citations
“…Figure 6 Table 2 shows the densities of these samples measured by the Archimedean method and the calculated ideal densities and porosities. The measured density of the AN sample is 2.06 g/cm 3 and the porosity of this sample was approximately 23.4%. As for the ANc sample, the measured density was 2.31 g/cm 3 and the porosity was 13.5%.…”
Section: Resultsmentioning
confidence: 93%
“…The measured density of the AN sample is 2.06 g/cm 3 and the porosity of this sample was approximately 23.4%. As for the ANc sample, the measured density was 2.31 g/cm 3 and the porosity was 13.5%. These results were consistent with the SEM images, revealing that the silica coating on the aluminum nitride powder enables it to increase the density of sintered samples containing the powder and silica powder.…”
Section: Resultsmentioning
confidence: 93%
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“…RF MEMS and power electronics applications of MEMS inductors account for over 300 studies. Excellent reviews on RF applications exist 1,2 . However, there are no reviews on the three other applications.…”
Section: Introductionmentioning
confidence: 99%
“…The performance of these components is constantly improving at radio frequency (RF) frequencies [12] and are already finding use in antenna tuning circuits [13]. The combination of these technologies with complementary metal oxide semiconductor (CMOS) processes is currently an active area of research [14].…”
Section: Introductionmentioning
confidence: 99%