2001
DOI: 10.1021/cm010431w
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Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers

Abstract: The evaluation and structural optimization of a family of single layer, positive tone, chemically amplified resists for 193-nm lithography is presented. The resists are formulated from cyclopolymeric materials in which the nature, etch properties, and spatial disposition of the substituents are systematically varied. Their lithographic performance is evaluated on the basis of the interplay between chemical structure, molecular weight, and comonomer composition. These materials have good optical clarity at the … Show more

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Cited by 42 publications
(26 citation statements)
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“…In order to reduce the polarity of the polar ammonium salt functionality, we chose the use of a very liphophilic perfluorinated counterion. This counterion has previously been used, for example, in combination with aromatic sulfonium cations in microlithography applications 16. The counterion exchange was performed by shaking a CH 2 Cl 2 solution of the fullerene derivative as the trifluoroacetate salt and a H 2 O solution of the commercially available potassium nonafluorobutane sulfonate.…”
Section: Resultsmentioning
confidence: 99%
“…In order to reduce the polarity of the polar ammonium salt functionality, we chose the use of a very liphophilic perfluorinated counterion. This counterion has previously been used, for example, in combination with aromatic sulfonium cations in microlithography applications 16. The counterion exchange was performed by shaking a CH 2 Cl 2 solution of the fullerene derivative as the trifluoroacetate salt and a H 2 O solution of the commercially available potassium nonafluorobutane sulfonate.…”
Section: Resultsmentioning
confidence: 99%
“…For the high contrast and fine resolution, post-exposure baking at 100 o C was carried out to ensure complete diffusion of generated photoacid. 29,30,34 It was also noted that the solubility difference between PBHBO and PBHBO-BOC was large enough to allow the fabrication of lithographic patterns.…”
Section: Fluorescence Imaging By Photopatterning Of Esipt Materials 2mentioning
confidence: 99%
“…Examples of chromophores able to undergo polarization and head to tail orientation upon the use of specific supramolecular interactions are known [36][37][38]. In this work, we present our synthetic approach for the obtainment of enantiopure binaphthyl systems of novel design and conception, in which the -bridge is extended through the 3,3 position.…”
Section: Introductionmentioning
confidence: 99%